High Purity Materials
Thin Film Substrates
Gold Sputtering coatings are a thin-film deposition process where gold or a gold alloy is bombarded with high energy ions in a vacuum chamber resulting in the gold atoms or molecules being “Sputtered” into the vapor and condensing on the substrate to be coated, such as jewelry, circuit boards or medical implants.
PVD Gold Sputtering is frequently conducted as a DC Sputtering process, which is among the simplest and least expensive sputtering equipment types. Gold is also commonly applied as a thin-film PVD process via Thermal Evaporation Deposition, where it is evaporated in a low-pressure environment with an electrically resistive heating element.
Another process is as Electron-beam Vapor Deposition, where the gold is heated with an electron-beam in a high vacuum which then condenses on the substrate to be coated. PVD Gold Sputter Coating is applied in the high energy plasma “Fourth state of nature” environment and can apply coatings on a single atom layer with extreme purity. It usually makes for the hardest and strongest bonding to the surface coated, where durability is key. It is the easiest to control the color of the gold coating with the PVD process.
Diagram of the DC Sputtering Process
AEM Deposition has over 10 years to manufacture and export high-quality gold sputtering targets, purity is 99.99-99.999%, including planar and rotary sputtering targets. You can contact us right now if you need gold sputtering targets or other precious sputtering targets. Our sales department will provide the solution for you.