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  • Yttrium Aluminum Oxide Sputtering Targets (Y3Al5O12) Video

    views, 2021/04/26
    Yttrium Aluminum Oxide Sputtering Targets (Y3Al5O12)
    Details as follows:
    Brand: AEM Deposition
    Purity: 99.9%
    Size: Φ 2" dia x 0.125" thick
    Tolerance: ± 0.1" on all the dimensions
     
    Applications:
    • Ferroelectric
    • Gate Dielectric
    • For CMOS
     
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    Boride sputtering targets: https://www.aemdeposition.com/boride-targets/
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    Telluride sputtering targets: https://www.aemdeposition.com/telluride-targets/
    Nitride sputtering targets: https://www.aemdeposition.com/nitride-targets/
    Fluoride sputtering targets: https://www.aemdeposition.com/fluoride-targets/

     
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