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Zirconium Telluride Sputtering Targets (ZrTe2)

Zirconium Telluride Sputtering Targets (ZrTe2)
Material Type Zirconium Telluride
Symbol ZrTe2
Color/Appearance Dark Grey, Solid
Melting Point (°C) N/A
Theoretical Density (g/cc) 6.42
Water Solubility Insoluble
Sputter RF, RF-R, DC
Type of Bond Indium, Elastomer
Comments  

General

Zirconium Telluride (ZrTe2) is a crystal grown product generally immediately available in most volumes. AEM specializes in producing high purity Zirconium Telluride Sputtering Targets with the highest possible density and smallest possible average grain sizes.

Material Notes

Zirconium Telluride Sputtering Target, Purity is 99.99%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.



Other Information of Zirconium Telluride Sputtering Targets

Applications
 Semiconductor
• Chemical vapor deposition (CVD)
• Physical vapor deposition (PVD) display

Features
Competitive pricing
• High purity
• Grain refined, engineered microstructure
• Semiconductor grade


Manufacturing Process
Refining
  Three-layer electrolytic process
• Melting and casting
  Electrical resistance furnace - Semi-continuous casting
• Grain refinement
  Thermomechanical treatment
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment

Options
99.999% minimum purity
• Planar circular targets up to 18'' (457mm) diameter
• Planar tiles up to 48'' (1200mm) X 15.75'' (400mm) for larger target configurations
• Smaller sizes also available for R&D applications
• Sputtering target bonding service

 

 

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