Titanium (Ti) Rotary Sputtering Target
Introduction
Titanium (Ti) Rotary sputtering targets have excellent properties for high melting point, low thermal expansion coefficient and good corrosion resistance. The utilaztion rate is much higher than planar sputtering targets. Changsha Advanced Engineering Materials (AEM) produces 99.5% to 99.999% purity of rotatable titanium sputtering targets with customzied sizes. The Titanium Rotary sputtering targets are widely used in Decoative Coating and Semiconductor Electronics Industries.
Specifications
| Materials | Titanium Rotary Sputtering Target |
| Symbol | Ti |
| Theoretical Density (g/cc) | 4.5 |
| Melting Point (°C) | 1660 |
| Production Method | Spraying Type |
| Monolithic Type | |
| Size | As per customer's drawings |
| Grain Sizes | <100 um |
Applications
- Thin Film Photovoltaic Solar Industry
- Semiconductor Electronics Industry
- Flat Panel Display Industry
- Construction / Automotive Glass Industry
- Decorative / Functional Coating Industry
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