Thin Film Substrate
Oxide Targets (Ceramic Sputtering Targets)
Sintering technology are used to produce ceramic sputtering targets, the shape can be round and rectangle.For round target,the diameter can be 1" to 14" , while thickness can be 3mm to 6.35mm, special size can be customized. For rectangle target, monolithic or several tiles construction will be supplied depending on the size. As ceramic sputtering targets are very fragile with very bad thermal conductivity, so usually it will be bonded with copper backing plate by indium, or elastomer, hence the targets' service time will be longer. AEM Deposition provides in-house sputtering target bonding services, you can click this link: Target Bonding to know more details.
AEM Deposition enjoys a very strong reputation by its excellent performance. We provides each sputtering target ships complete with a Certificate of Analysis and SDS. You can click the "details" to get more information. We also provides Special Tailor-Made Targets for our client. Customized target products made of high purity raw material powder with super fine grain size, together with the distinguished homogeneous microstructure to achieve the longer life for targets and desired characteristics of sputtering deposited thin film. If you can't find the sputtering target you need in the list, please contact [email protected] or 86-731-89578196 for your custom R&D or production materials needs.
For a listing of Frequently Asked Questions (FAQs) about Sputtering Targets, please see this link: Sputtering Targets FAQ.
Oxide Sputtering Target Material List
AZO Sputtering Targets (Al2O3/ZnO 2/98 wt%)
Indium Tin Oxide Sputtering Targets (ITO)
Indium Zinc Oxide Sputtering Targets (IZO)
Zinc Oxide doped with Gallium Oxide (GZO) Sputtering Targets (ZnO/Ga2O3 95/05 wt%)
Zirconia Fully Stabilized with Yttria (YSZ) Sputtering Targets ZrO2 (fully stabilized - Y2O3)