High Purity Materials
Thin Film Substrates
Silicide Sputtering Targets
Silicide is a compound that has silicon with (usually) more electropositive elements. Silicon is more electropositive than carbon. Silicides are structurally closer to borides than to carbides. Similar to borides and carbides, the composition of silicides cannot be easily specified as covalent molecules. The chemical bonds in silicides range from conductive metal-like structures to covalent or ionic. Our silicide sputtering targets include CrSi, CrSi2, Fe3Si, Mg2Si, MoSi2, TaSi2, TiSi2, WSi2 sputtering targets.
AEM has a solid reputation for its excellent performance. We offer each sputtering target with a certificate of analysis and Safety Data Sheet (SDS). In the below list, you can get all of the Silicide Sputtering Targets. You can click the product name to get more details or click "inquiry" to get high-quality products at affordable prices.
AEM Deposition, as a target supplier, also offers particular customize targets to the clients. We offer customized target products made of high-purity raw material powder with super fine grain size. These products have the recognized consistent microstructure to achieve a longer life for targets and desired characteristics of the sputtering deposited thin film. For your custom R&D, sputtering target need, or if you do not find the sputtering target as per your requirement. Contact us via email at [email protected] or call us at +86-731-89578196.
We also offer in-house, sputtering target bonding services. You can click the link: Target Bonding to know more.
For Frequently Asked Questions (FAQ) about Sputtering Targets, please visit this link: Sputtering Targets FAQ.
Silicide Targets Material List
|Product Name||Symbol||Target Types||Purity||Details|
|Chromium Silicide Sputtering Targets||CrSi||Planar||99.50%||Detail|
|Chromium Silicide Sputtering Targets||CrSi2||Planar||99.50%||Detail|
|Iron Silicide Sputtering Targets||Fe3Si||Planar||99.50%||Detail|
|Magnesium Silicide Sputtering Targets||Mg2Si||Planar||99.50%||Detail|
|Molybdenum Disilicide Sputtering Targets||MoSi2||Planar||99.50%||Detail|
|Tantalum Silicide Sputtering Targets||TaSi2||Planar||99.50%||Detail|
|Titanium Disilicide Sputtering Targets||TiSi2||Planar||99.50%||Detail|
|Tungsten Disilicide Sputtering Targets||WSi2||Planar||99.50%||Detail|