Thin Film Substrates
Alloy Sputtering Targets
Alloy sputtering targets are materials composed of one metal and other metals or non-metals while still showing some metallic characteristics. Alloys are generally considered to be metallic in nature because they are good thermal and electrical conductors. Alloy is usually obtained by fusing the respective molten components and cooling from high temperatures to become condensates. Most alloys are mixtures rather than pure chemical substances, but each ingredient in the alloy retains its chemical properties. Alloys can be manufactured in various methods. The most widely used process is to melt the constituents together and cool the resultant mixture, to form a single or multi-phase solid. According to the number of elements contained, alloy sputtering target is categorized into the binary alloy, ternary alloy, and multicomponent alloy. Alloys have much more extensive and essential industrial applications than pure metals. So people rarely use pure metals as compared to alloys. Alloy sputtering targets share some traits with pure metal sputtering targets, including crystal structure under the solid-state, special metallic luster, opacity, fine electric conductivity, thermal conductivity, and ductility.
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AEM Deposition, as a target supplier, also offers particular customize targets to the clients. We offer customized target products made of high-purity raw material powder with super fine grain size. These products have the recognized consistent microstructure to achieve a longer life for targets and desired characteristics of the sputtering deposited thin film.
For your custom R&D, production materials need or if you do not find the sputtering target as per your need from the list. Contact us via email at [email protected] or call us at +86-731-89578196.
We also offer in-house, sputter target bonding services. You can click the link: Target Bonding to know more.
For Frequently Asked Questions (FAQ) about Sputtering Targets, please visit this link: Sputtering Targets FAQ.