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AEM Deposition
Nitride Sputtering Targets

Nitride Sputtering Targets

Nitride is a compound of nitrogen where nitrogen has a formal oxidation state of 3-. Nitrides are a large class of compounds with a wide range of properties and applications. Like carbides, nitrides are often refractory materials due to their high lattice energy. They reflect the strong attraction of "N3−" for the metal cation. Thus, titanium nitride and silicon nitride are used as cutting materials and hard coatings. Hexagonal boron nitride (layered structure) is a useful high-temperature lubricant similar to molybdenum disulfide. Nitride compounds often have large band gaps. Thus nitrides are usually insulators or wide bandgap semiconductors. Examples include boron nitride and silicon nitride. Our nitride sputtering targets include AlN, BN, CrN, HfN, NbN, Si3N4, TaN, TiN, ZrN sputtering targets.


AEM has a solid reputation for its excellent performance. We offer each sputtering target with a certificate of analysis and Safety Data Sheet (SDS).  In the below list, you can get all of Nitride Sputtering Targets. By clicking the product name, you can get more details, and you can also click "inquiry" to get affordable prices and high quality.


AEM Deposition, as a target supplier, also offers particular customize targets to the clients. We offer customized target products made of high-purity raw material powder with super fine grain size. These products have the recognized consistent microstructure to achieve a longer life for targets and desired characteristics of the sputtering deposited thin film. For your custom R&D, sputtering target need, or if you do not find the sputtering target as per your requirement. Contact us via email at [email protected] or call us at +86-731-89578196.


We also offer in-house, sputter target bonding services. You can click the link: Target Bonding to know more.


For Frequently Asked Questions (FAQ) about Sputtering Targets, please visit this link: Sputtering Targets FAQ.

Nitride Targets Material List

Product Name Symbol Target Types Purity Details
Aluminum Nitride Sputtering Targets AlN Planar 99.50% Detail
Boron Nitride Sputtering Targets BN Planar 99.50% Detail
Chromium Nitride Sputtering Targets CrN Planar 99.50% Detail
Hafnium Nitride Sputtering Targets HfN Planar 99.50% Detail
Niobium Nitride Sputtering Targets NbN Planar 99.50% Detail
Silicon Nitride Sputtering Targets Si3N4 Planar 99.90% Detail
Tantalum Nitride Sputtering Targets TaN Planar 99.50% Detail
Titanium Nitride Sputtering Targets TiN Planar 99.50% Detail
Zirconium Nitride Sputtering Targets ZrN Planar 99.50% Detail