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AEM Deposition
Carbide Targets

Carbide Targets

In chemistry, a carbide is a compound composed of carbon and a less electronegative element. Carbides can be generally classified by the chemical bonds type as follows: (i) salt-like, (ii) covalent compounds, (iii) interstitial compounds, and (iv) "intermediate" transition metal carbides. Examples include calcium carbide (CaC2), silicon carbide (SiC), tungsten carbide (WC) (often called simply carbide when referring to machine tooling), and cementite (Fe3C),each used in key industrial applications. The naming of ionic carbides is not systematic. Our carbide  sputtering targets include B4C, HfC, Mo2C, NbC, SiC, TaC, TiC, WC,  VC, ZrC sputtering targets.

AEM enjoys a very strong reputation by its excellent performance. We provides Each sputtering target ships complete with a Certificate of Analysis and SDS. In the following list, you can get all of Carbide Sputtering Targets. You can click the product name to get more details, and you can also click "inquiry" to get great prices and quality.

AEM Deposition as a target supplier, also provides Special Tailor-Made Targets for our client. Customized target products made of high purity raw material powder with super fine grain size, together with the distinguished homogeneous microstructure to achieve the longer life for targets and desired characteristics of sputtering deposited thin film. If you can't find the sputtering target you need in the list, please contact [email protected] or 86-731-89578196 for your custom R&D or production materials needs.

We also provide in-house sputter target bonding services, you can click this link: Target Bonding to know more details.

For a listing of Frequently Asked Questions (FAQs) about Sputtering Targets, please see this link: Sputtering Targets FAQ.

Carbide Sputtering Target Material List

Product Name Symbol Targets Type Purity Detail
Boron Carbide Sputtering Targets B4C Planar 99.50% Detail
Hafnium Carbide Sputtering Targets HfC Planar 99.50% Detail
Molybdenum Carbide Sputtering Targets Mo2C Planar 99.50% Detail
Niobium Carbide Sputtering Targets NbC Planar 99.50% Detail
Silicon Carbide Sputtering Targets SiC Planar 99.50% Detail
Tantalum Carbide Sputtering Targets TaC Planar 99.50% Detail
Titanium Carbide Sputtering Targets TiC Planar 99.50% Detail
Tungsten Carbide Sputtering Targets WC Planar 99.95% Detail
Vanadium Carbide Sputtering Targets VC Planar 99.50% Detail
Zirconium Carbide Sputtering Targets ZrC Planar 99.50% Detail