Thin Film Substrates
Carbide Sputtering Targets
Carbide is a compound composed of carbon and a less electronegative element. The chemical bonds type can generally classify carbides as (i) salt-like, (ii) covalent compounds, (iii) interstitial compounds, and (iv) "intermediate" transition metal carbides. Examples include calcium carbide (CaC2), silicon carbide (SiC), tungsten carbide (WC) (often called only "carbide" when referring to machine tooling), and cementite (Fe3C). All these have key industrial applications. The naming of ionic carbides is not systematic. Our carbide sputtering targets include B4C, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, VC, ZrC sputtering targets.
AEM has a solid reputation for its excellent performance. We offer each sputtering target with a certificate of analysis and Safety Data Sheet (SDS). In the below list, you can get all of Carbide Sputtering Targets. By clicking the product name, you can get more details, and you can also click "inquiry" to get affordable prices and high quality.
AEM Deposition, as a target supplier, also offers particular customize targets to the clients. We offer customized target products made of high-purity raw material powder with super fine grain size. These products have the recognized consistent microstructure to achieve a longer life for targets and desired characteristics of the sputtering deposited thin film. For your custom R&D, sputtering target need, or if you do not find the sputtering target as per your requirement. Contact us via email at [email protected] or call us at +86-731-89578196.
We also offer in-house, sputter target bonding services. You can click the link: Target Bonding to know more.
For Frequently Asked Questions (FAQ) about Sputtering Targets, please visit this link: Sputtering Targets FAQ.
Carbide Sputtering Targets Material List
|Product Name||Symbol||Target Types||Purity||Details|
|Boron Carbide Sputtering Targets||B4C||Planar||99.50%||Detail|
|Hafnium Carbide Sputtering Targets||HfC||Planar||99.50%||Detail|
|Molybdenum Carbide Sputtering Targets||Mo2C||Planar||99.50%||Detail|
|Niobium Carbide Sputtering Targets||NbC||Planar||99.50%||Detail|
|Silicon Carbide Sputtering Targets||SiC||Planar||99.50%||Detail|
|Tantalum Carbide Sputtering Targets||TaC||Planar||99.50%||Detail|
|Titanium Carbide Sputtering Targets||TiC||Planar||99.50%||Detail|
|Tungsten Carbide Sputtering Targets||WC||Planar||99.95%||Detail|
|Vanadium Carbide Sputtering Targets||VC||Planar||99.50%||Detail|
|Zirconium Carbide Sputtering Targets||ZrC||Planar||99.50%||Detail|