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AEM Deposition
Carbide Sputtering Targets

Carbide Sputtering Targets

Carbide is a compound composed of carbon and a less electronegative element. The chemical bonds type can generally classify carbides as (i) salt-like, (ii) covalent compounds, (iii) interstitial compounds, and (iv) "intermediate" transition metal carbides. Examples include calcium carbide (CaC2), silicon carbide (SiC), tungsten carbide (WC) (often called only "carbide" when referring to machine tooling), and cementite (Fe3C). All these have key industrial applications. The naming of ionic carbides is not systematic. Our carbide  sputtering targets include B4C, HfC, Mo2C, NbC, SiC, TaC, TiC, WC,  VC, ZrC sputtering targets.


AEM has a solid reputation for its excellent performance. We offer each sputtering target with a certificate of analysis and Safety Data Sheet (SDS).  In the below list, you can get all of Carbide Sputtering Targets. By clicking the product name, you can get more details, and you can also click "inquiry" to get affordable prices and high quality.


AEM Deposition, as a target supplier, also offers particular customize targets to the clients. We offer customized target products made of high-purity raw material powder with super fine grain size. These products have the recognized consistent microstructure to achieve a longer life for targets and desired characteristics of the sputtering deposited thin film. For your custom R&D, sputtering target need, or if you do not find the sputtering target as per your requirement. Contact us via email at [email protected] or call us at +86-731-89578196.


We also offer in-house, sputter target bonding services. You can click the link: Target Bonding to know more.


For Frequently Asked Questions (FAQ) about Sputtering Targets, please visit this link: Sputtering Targets FAQ.

Carbide Sputtering Targets Material List

Product Name Symbol Target Types Purity Details
Boron Carbide Sputtering Targets B4C Planar 99.50% Detail
Hafnium Carbide Sputtering Targets HfC Planar 99.50% Detail
Molybdenum Carbide Sputtering Targets Mo2C Planar 99.50% Detail
Niobium Carbide Sputtering Targets NbC Planar 99.50% Detail
Silicon Carbide Sputtering Targets SiC Planar 99.50% Detail
Tantalum Carbide Sputtering Targets TaC Planar 99.50% Detail
Titanium Carbide Sputtering Targets TiC Planar 99.50% Detail
Tungsten Carbide Sputtering Targets WC Planar 99.95% Detail
Vanadium Carbide Sputtering Targets VC Planar 99.50% Detail
Zirconium Carbide Sputtering Targets ZrC Planar 99.50% Detail