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Sputtering Targets
Metal sputtering targets are usually made from highly pure metals. They are the most widely used and fundamental coating materials for other sputter deposition technology.
Alloy sputtering targets are materials composed of one metal and other metals or non-metals while still showing the some metallic characteristics.
Oxide sputtering targets with one or more oxides being the main principal components and other minor oxides being the additives.
Sulfide, also spelled sulphide. Sulfide is a quite common material for sputtering targets. A lot of sulfide compounds has unique properties in optical properties.
As a senior sputtering targets manufacturer and exporter, AEM Deposition has long and good experience for all kinds of sputtering targets production, including Pure Matel, Alloy, Oxide, Sulfide, Selenide, Boride, Carbide, Silicide, Telluride, Nitride, Fluoride Targets. AEM Deposition enjoys a very strong reputation by its excellent performance. We provides each sputtering target ships complete with a Certificate of Analysis and SDS.
Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process is repeatable and can be scaled up from small research and development projects, to production batches involving medium to large substrate areas. The sputtering gas is often an inert gas such as argon. For efficient momentum transfer projectile mass must match target mass, so for sputtering light elements neon is also used and for heavy elements krypton or xenon. Reactive gases are used to sputter compounds. The chemical reaction can occur on the target surface, in-flight or on the substrate depending on the process parameters. The many parameters make sputter deposition a complex process but allow experts a large degree of control over the growth and microstructure of the film.
To achieve the desired characteristics in a sputter deposited thin film, the manufacturing process used to fabricate the sputter target can be critical. Whether the target material comprises only an element, mixture of elements, alloys, or perhaps a compound; the process to produce that defined material in a form suitable for sputtering thin films of consistent quality is as essential as the deposition run parameters perfected by the thin film process engineers and scientists.Providing Special Tailor-Made Targets for our clients to research and development (R & D) is the strong point of AEM Deposition. Customized target products made of high purity raw material powder with super fine grain size, together with the distinguished homogeneous microstructure to achieve the longer life for targets and desired characteristics of sputtering deposited thin film.
As a senior sputtering targets supplier, We also provide in-house Sputtering Target Bonding services, including Indium Metallic Bonding and Epoxy Bonding.
