Sputtering Targets
Evaporation Materials
Evaporation Sources
High Purity Materials
Thin Film Substrates
Crytstal Materials
Sputtering Targets
Titanium (Ti) Rotary sputtering targets have excellent properties for high melting point, low thermal expansion coefficient and go...
Chromium (Cr) Rotary sputtering targets are excellent materials used for Construction Glass coating and and for Decorative Coating...
Copper (Cu) Rotary sputtering targets have excellent properties of high thermal conductivity, electrical conductivity, ductility, ...
Changsha Advanced Engineering Materials (AEM) produces Aluminum (Al) Rotary Sputtering Targets with spraying and monolithic type. ...
Changsha Advanced Engineering Materials (AEM) manufactures high quality of Niobium Rotary sputtering targets by cold spraying and ...
Molybdenum (Mo) Rotary Sputtering Targets are used for vacuum coating after molybdenum powder metallurgy through sintering, spinni...
Zirconium (Zr) Rotary Sputtering Targets have excellent characteristics of high hardness, ductility and corrosion resistance. They...
Silicon (Si) Rotary Sputtering Targets have two types forms for Monocrystalline and polycrystalline. We can prdcuce both types of ...
Indium Tin Oxide (ITO) Rotary Sputtering Targets are widely used to form electrically transparent thin films. Indium tin oxide (IT...
AZO is a kind of high stability transparent conductive film material, which has high visible light transmittance and low resistivi...
Changsha Advanced Engineering Materials (AEM) produces Titanium Oxide (TiOx) Rotary Sputtering Targets with low oxygen content, wh...
Changsha Advanced Engineering Materials (AEM) produces Niobium Oxide (Nb2Ox) Rotary Sputtering Targets with low oxygen content, wh...