Aluminum (Al) Rotary Sputtering Target
Introduction
Changsha Advanced Engineering Materials (AEM) produces Aluminum (Al) Rotary Sputtering Targets with spraying and monolithic type. Aluminum Rotary sputtering targets are widely used in Decoative Coating and Semiconductor Electronics Industries. The coatings can be used for reflective films, conductive films, capacitor films, semiconductor films, decorative films, protective films, integrated circuits, displays, etc.
Specifications
| Materials | Aluminum Rotary Sputtering Target |
| Symbol | Al |
| Purity | 99.99%-99.999% |
| Theoretical Density (g/cc) | 2.7 |
| Melting Point (°C) | 660 |
| Production Method | Spraying Type / Monolithic Type |
| Backing Tube | Titanium, Stainless Steel |
| Size | As per customer's drawings |
| Relative Density | >=96% |
| Grain Sizes | <100 um |
| Annual Capacity | 1000 tons |
Applications
- Thin Film Photovoltaic Solar Industry
- TFT-LCD coating
- Semiconductor Electronics Industry
- Flat Panel Display Industry
- Decorative / Functional Coating Industry
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