Copper (Cu) Rotary Sputtering Target
Introduction
Copper (Cu) Rotary sputtering targets have excellent properties of high thermal conductivity, electrical conductivity, ductility, corrosion resistance, which are widely used in PCB, TFT-LCD and Decoative Coating. Changsha Advanced Engineering Materials (AEM) produces 99.9% to 99.9999% purity of rotatable Copper sputtering targets with customized sizes.
Specifications
| Materials | Copper Rotary Sputtering Target |
| Symbol | Cu |
| Purity | 99.95%-99.9999% |
| Theoretical Density (g/cc) | 8.92 |
| Melting Point (°C) | 1,083 |
| Production Method | Spraying Type / Monolithic Type |
| Backing Tube | Titanium, Stainless Steel |
| Size | As per customer's drawings |
| Relative Density | >=96% |
| Grain Sizes | <100 um |
| Annual Capacity | 1000 tons |
Applications
- Producing pure Cu film
- PCB coating
- Semiconductor Electronics Industry
- TFT-LCD coating
- Construction / Automotive Glass Industry
- Decorative / Functional Coating Industry
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