Copper (Cu) Rotary Sputtering Target


Introduction
Copper (Cu) Rotary sputtering targets have excellent properties of high thermal conductivity, electrical conductivity, ductility, corrosion resistance, which are widely used in PCB, TFT-LCD and Decoative Coating. Changsha Advanced Engineering Materials (AEM) produces 99.9% to 99.9999% purity of rotatable Copper sputtering targets with customized sizes.
Specifications
Materials | Copper Rotary Sputtering Target |
Symbol | Cu |
Purity | 99.95%-99.9999% |
Theoretical Density (g/cc) | 8.92 |
Melting Point (°C) | 1,083 |
Production Method | Spraying Type / Monolithic Type |
Backing Tube | Titanium, Stainless Steel |
Size | As per customer's drawings |
Relative Density | >=96% |
Grain Sizes | <100 um |
Annual Capacity | 1000 tons |
Applications
- Producing pure Cu film
- PCB coating
- Semiconductor Electronics Industry
- TFT-LCD coating
- Construction / Automotive Glass Industry
- Decorative / Functional Coating Industry



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