Molybdenum (Mo) Rotary Sputtering Target
Introduction
Molybdenum (Mo) Rotary Sputtering Targets are used for vacuum coating after molybdenum powder metallurgy through sintering, spinning rolling and machining. The coatings are used in the production of molybdenum layers for CIGS back contacts or thin-film transistors in flat screens (TFT LCD, OLED). Changsha Advanced Engineering Materials (AEM) produces 99.95% purity of Molybdenum rotatable sputtering targets with customized sizes.
Specifications
| Materials | Molybdenum Rotary Sputtering Target |
| Symbol | Mo |
| Purity | 99.95% |
| Theoretical Density (g/cc) | 2.7 |
| Melting Point (°C) | 10.2 |
| Production Method |
Spraying Type
Monolithic Type (HIP)
Bonded Type (HIP)
|
| Backing Tube | Titanium, Stainless Steel |
| Size | As per customer's drawings |
| Relative Density | >=99% |
| Grain Sizes | <100 um |
| Annual Capacity | 1000 tons |
Applications
- Thin Film Photovoltaic Solar Industry
- Semiconductor Electronics Industry
- Flat Panel Display Industry
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