Niobium Oxide (Nb2Ox) Rotary Sputtering Target
![Niobium Oxide (Nb2Ox) Rotary Sputtering Target](/fup/220512/1-22051212021T20.jpg)
![Niobium Oxide (Nb2Ox) Rotary Sputtering Target](/fup/220512/1-22051212021T20.jpg)
Introduction
Changsha Advanced Engineering Materials (AEM) produces Niobium Oxide (Nb2Ox) Rotary Sputtering Targets with low oxygen content, which are widely used in low-e glass film system, thin film solar cell electrode film system,TFT, semiconductor Industry. The dimensions can be produced according to customer's requirements.
Specifications
Materials | Niobium Oxide Rotary Sputtering Target |
Symbol | Nb2Ox (4.3<x<4.9) |
Purity | >=99.95% |
Melting Point (°C) | N/A |
Production Method | Spraying Type |
Bonded Type (Cold isostatic pressing + high temperature sintering) |
Backing Tube | Titanium, Stainless Steel |
Bonding Material | Indium or Elastomer |
Size | As per customer's drawings |
Relative Density | >=95% (>=4.3 g/cm³) |
Resistivity (Ω.cm) | <=0.1 |
Annual Capacity | 1000 tons |
Applications
- Thin Film Photovoltaic Solar Industry
- Semiconductor Electronics Industry
- TFT-LCD Coating
- Construction / Automotive Glass Industry
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