Silicon (Si) Rotary Sputtering Target
Introduction
Silicon (Si) Rotary Sputtering Targets have two types forms for Monocrystalline and polycrystalline. We can prdcuce both types of Silicon (Si) Rotary Sputtering Targets by spraying or bonded type with low oxygen content and good refine surface and uniform grains. They are mainly used in Conductive Glass and Thin Film Photovoltaic Solar Industry.
Changsha Advanced Engineering Materials (AEM) produces 99.9%-99.999% purity of Silicon (Si) rotary sputtering targets with customized sizes.
Specifications
| Materials | Silicon (Si) Rotary Sputtering Target |
| Symbol | Si |
| Conduction Type |
P-type doped Boron
N-type doped Phosphorus
|
| Purity | 99.9%-99.999% |
| Theoretical Density (g/cc) | 2.32 |
| Melting Point (°C) | 1,410 |
| Production Method |
Spraying Type
Bonded Type (CZ)
|
| Backing Tube | Titanium, Stainless Steel |
| Resistivity (Ω.cm) | 0.01-400 |
| Size | As per customer's drawings |
| Relative Density | >=96% |
| Grain Sizes | <100 um |
| Annual Capacity | 1000 tons |
Applications
- SiO2/Si3N4 Film
- Thin Film Photovoltaic Solar Industry
- Semiconductor Electronics Industry
- Flat Panel Display Industry
- Construction / Automotive Glass Industry
- Optical Industry
- Decorative / Functional Coating Industry
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