Samarium Oxide Sputtering Targets (Sm2O3)

Samarium Oxide thin films are obtained by pulsed laser deposition and by radiofrequency assisted pulsed laser deposition. Three different substrate types used are silicon, platinum covered silicon, and titanium covered silicon. The deposition parameters (oxygen pressure and laser fluence) on the thin films' structure and morphology are studied. The substrate-thin film interface zone is investigated. The optical and electrical properties (the losses, dielectric constant, and leakage currents) are also determined.