Thin Film Substrate
Erbium Oxide Sputtering Targets (Er2O3)
|Material Type||Erbium Oxide|
|Melting Point (°C)||2,350|
|Theoretical Density (g/cc)||8.64|
|Type of Bond||Indium, Elastomer|
Erbium Oxide Sputtering Targets, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.This material may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.