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AEM Deposition

Terbium Ferrite Sputtering Targets (Tb3Fe5O12)

Terbium Ferrite Sputtering Targets (Tb3Fe5O12)
Terbium Ferrite Sputtering Targets (Tb3Fe5O12)
Material Type Terbium Ferrite
Symbol Tb3Fe5O12
Color/Appearance Various colors, Solid
Melting Point (°C) N/A
Theoretical Density (g/cc) N/A
Water Solubility Insoluble
Sputter RF, RF-R, DC
Type of Bond Indium, Elastomer


The present work gives the results of a theoretical and experimental study of the Faraday effect in Tb3Fe5O12. Important observations included the orientation dependence of the Faraday effect, the 'anomalous' field dependence of the Faraday effect in unsaturated specimens at low temperatures, and the asymmetry of the temperature hysteresis loop near the compensation point.

Material Notes

Terbium Ferrite Sputtering Target, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.



Other Information of Terbium Ferrite Sputtering Targets

• Gate Dielectric

• For CMOS

• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

• 99.9% ex Strontium Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

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