Iridium Oxide Sputtering Targets (IrO2)
| Material Type | Iridium Oxide |
| Symbol | IrO2 |
| Color/Appearance | Black Target |
| Melting Point (°C) | 1100 |
| Density | 11.7 |
| Molecular Weight | 224.22 |
| Sputter | Indium, Elastomer |
| Exact Mass | 224.953 |
Iridium Oxide Sputtering Targets
Iridium oxide (IrO2) thin films have low resistivity and excellent thermal stability. It has attracted attention as an alternative for electrode material in high-density memory devices (DRAM: Dynamic Random Access Memory). The Iridium oxide (IrO2) thin films have been successfully deposited on Si substrates by DC magnetron sputtering from a metal Ir target in an O 2-Ar plasma. AEM offers customized Iridium Oxide Sputtering Targets according to customer's requirements.
Iridium Oxide Sputtering Targets Information
Iridium Oxide Sputtering Targets
Purity: 99.95%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Iridium Oxide Sputtering Targets
Applications• Ferroelectric• Gate Dielectric • For CMOS |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.95% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Iridium Oxide Sputtering Targets
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Ceramic Sputtering Targets |
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Evaporation Materials Iridium Evaporation Pellet |
Crucibles N/A |
Metal Powders N/A |
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