Thin Film Substrate
Iridium Oxide Sputtering Targets (IrO2)
|Material Type||Iron Oxide|
|Melting Point (°C)||1566|
Iron Oxide the inorganic compound with the formula Fe2O3. It is one of the three main oxides of iron, the other two being iron(II) oxide (FeO), which is rare, and iron(II,III) oxide (Fe3O4), which also occurs naturally as the mineral magnetite. As the mineral known as hematite, Fe2O3 is the main source of iron for the steel industry. Fe2O3 is ferromagnetic, dark red, and readily attacked by acids. Iron(III) oxide is often called rust, and is acidic in nature and to some extent this label is useful, because rust shares several properties and has a similar composition. To a chemist, rust is considered an ill-defined material, described as hydrated ferric oxide.
Iron Oxide Sputtering Target, Purity is 99.99%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
Other Information of Iron Oxide Sputtering Targets
• Gate Dielectric
• For CMOS
• High purity
• Custom Sizes Available
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum,
• 99.9% ex Strontium Minimum Purity
•Up to 12'' Diameter Targets Available
•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations