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AEM Deposition
Nickel Chromium Sputtering Target Video

Nickel Chromium Sputtering Target Video

Date: 2021-01-22

Keywords: Nickel,Chromium,Sputtering,Target,Video,Nickel,Chromium,

Abstract: NiCr 80/20 wt% Sputtering Target.Brand: AEM Deposition Purity: 99.9%.Size: Φ 54 mm x Φ 43 mm x 20 mm.Tolerance: ± 0.1" on all the dimensions

CdS Sputtering Target Video

CdS Sputtering Target Video

Date: 2021-01-22

Keywords: CdS,Sputtering,Target,Video,CdS,Sputtering,Target,https,

Abstract: CdS Sputtering Targets.Brand: AEM Deposition.Purity: 99.99%.Size: Φ2" x 3 mm.Tolerance: ± 0.1 mm on all dimensions

Pyrolytic Graphite Sputtering Target Video

Pyrolytic Graphite Sputtering Target Video

Date: 2021-01-22

Keywords: Pyrolytic,Graphite,Sputtering,Target,Video,Pyrolytic,

Abstract: Pyrolytic Graphite Sputtering Targets. Brand: AEM Deposition. Purity: 99.99%. Size: Φ2" x 3 mm. Tolerance: ± 0.1 mm

Cr Sputtering Target Video

Cr Sputtering Target Video

Date: 2021-01-22

Keywords: Sputtering,Target,Video,AEM,Deposition,Chromium,Sputtering,

Abstract: Cr Sputtering Target. Brand: AEM Deposition. Purity: 99.5% Size: Φ100 x 30 mm

Si3N4 Sputtering Target Video

Si3N4 Sputtering Target Video

Date: 2021-01-22

Keywords: Si3N4 Sputtering Target Video

Abstract: Si3N4 Sputtering Target. Brand: AEM Deposition. Purity: 99.99%. Size: Φ2" x 0.125"

TiO Sputtering Target Video

TiO Sputtering Target Video

Date: 2021-01-22

Keywords: TiO,Sputtering,Target,Video,TiO,Sputtering,Target,https,

Abstract: TiO Sputtering Target.Brand: AEM Deposition.Purity: 99.95%.Size: Φ2" x 0.125"

Boron Sputtering Target Video

Boron Sputtering Target Video

Date: 2021-01-22

Keywords: Boron,Sputtering,Target,Video,Boron,Sputtering,Target,https,

Abstract: Boron Sputtering Target. Brand: AEM Deposition. Purity: 99.9%. Size: Φ2" x 0.125"

La0.8Sr0.2MnO3 Sputtering Target Video

La0.8Sr0.2MnO3 Sputtering Target Video

Date: 2021-01-22

Keywords: La0.8Sr0.2MnO3,Sputtering,Target,Video,La0.8Sr0.2MnO3,

Abstract: La0.8Sr0.2MnO3 Sputtering Target, Brand: AEM Deposition,Purity: 3N 99.9%, Size: Φ51 x 3 mm / Φ51 x 3 mm

Indium Selenide Sputtering Target Video

Indium Selenide Sputtering Target Video

Date: 2021-01-22

Keywords: Indium,Selenide,Sputtering,Target,Video,In2Se3,Sputtering,

Abstract: In2Se3 Sputtering Target.Brand: AEM Deposition.Purity: 99.99%.Size: Φ 2" x 2.0 mm.Indium bonding to a Cu backing plate

Titanium Disilicide Sputtering Target Video

Titanium Disilicide Sputtering Target Video

Date: 2021-01-22

Keywords: Titanium,Disilicide,Sputtering,Target,Video,Titanium,

Abstract: TiSi2 Sputtering Target.Brand: AEM Deposition.Purity: 99.5%. Size: Φ2" x 0.125" + Cu

Tantalum Sputtering Target Video

Tantalum Sputtering Target Video

Date: 2021-01-22

Keywords: Tantalum,Sputtering,Target,Video,Tantalum,Sputtering,Target,

Abstract: Tantalum (Ta) Sputtering Target. Purity: 99.95%. Size: 450 mm x 150 mm x 8 mm. Tolerance: ± 0.1" on all the dimensions

GZO Sputtering Target Video

GZO Sputtering Target Video

Date: 2021-01-22

Keywords: GZO,Sputtering,Target,Video,GZO,Sputtering,Target,https,

Abstract: GZO Sputtering Target. Brand: AEM Deposition. Purity: 99.99%. Size: Φ76.2 x 6.35 mm