Thin Film Substrate
Comparison of the Melt Casting and Spray Rotating Sputtering targets
Abstract: The target material is an important raw material for vacuum coating. The purity and density of the target material directly affect the composition and comprehensive performance of the film system. With the rapid development of sputtering coating technology, new target preparation technology is emerging, and the target quality and performance have been improved significantly. Because of the high utilization rate, the rotating target has been widely used in the coating industry. AEM deposition can provide various kinds of rotating sputtering targets, as shown in the table below:
List of Sputtering Targets for Solar Cell Coating
Abstract: Solar energy is mainly used to convert solar energy into heat and electricity. Among them, the photoelectric conversion is realized by the solar cell which directly converts the light energy into electric energy through the photoelectric effect. At present, the solar cell has developed to the third generation. The first generation is monocrystalline silicon solar cells, the second generation is amorphous silicon and polycrystalline silicon solar cells, and the third generation is thin-film solar cells (represented by CIGS).
List of Sputtering Targets for Semiconductor Coating
Abstract: Sputtering target material for semiconductor has a high requirement for the purity of the target material, which is generally more than 4N or 5N, so the target material for semiconductor coating is also very expensive. The sputtering targets for semiconductor coating mainly include W sputtering target, W-Ti sputtering target, Ti sputtering target, Ta sputtering target, Al sputtering target, Cu sputtering target, etc. The details are as follows:
List of Sputtering Targets for Flat Panel Display Coating
Abstract: In order to ensure the uniformity of large area film, improve productivity and reduce cost, sputtering technology is more and more used to prepare flat panel display film. The sputtering targets for flat display coating mainly include Cr sputtering target, Mo sputtering target, Al sputtering target, Al alloy sputtering target, Cu sputtering target, Cu alloy sputtering target and ITO sputtering target. The details are as follows:
Development Trend of Sputtering Target Industry
Abstract: Sputtering target materials have shown a rapid growth momentum in the international and domestic markets, and the era of scale application and industrialization has come. The development trend of target industry is firstly market differentiation. Products with low technology content will gradually face more fierce competition. Many small target companies have flexible mechanism and low production cost, which will make the low-end target market form the mode of price war; while the target market in the high-end industries such as magnetic recording, semiconductor, solar energy, etc. will continue to show the trend of technology leading, and the sputtering target suppliers with advanced technology at home and abroad will have an absolute advantage in the competition, and the coating manufact
List of Sputtering Targets for Magnetic Recording Coating
Abstract: The sputtering targets used for sputtering film recording include chromium based sputtering targets, cobalt based sputtering targets, cobalt iron sputtering targets, nickel based sputtering targets and other alloy sputtering targets. The details are as follows:
List of Sputtering Targets for Electronic Device Coating
Abstract: Sputtering target can be used for coating electronic devices. Electronic device coating is mainly used for film resistance and film capacitance. The film resistor can provide 10-1000m Ω resistor, and the temperature coefficient of the resistor is small and the stability is good, which can effectively reduce the size of the device. Therefore, sputtering targets are often used.
List of Sputtering Targets for Glass Coating
Abstract: Correspondingly, the demand of target materials for glass coating is increasing rapidly. The sputtering target materials for glass coating mainly include: silver sputtering target, chromium sputtering target, titanium sputtering target, nickel chromium sputtering target, zinc tin sputtering target, silicon aluminum sputtering target, titanium oxide sputtering target, etc. The details as follows:
List of Sputtering Targets for Coating of Tools and Moulds
Abstract: The main types of sputtering targets for tool mould coating are titanium aluminum sputtering target, chromium aluminum sputtering target, chromium sputtering target, titanium sputtering target, etc. The details are as follows:
List of Sputtering Targets for Decorative Coating
Abstract: The main types of target materials for decorative coating are: chromium sputtering target, titanium sputtering target, zirconium sputtering target, nickel sputtering target, tungsten sputtering target, titanium aluminum sputtering target, etc. The details are as follows:
Development Trend of ITO Sputtering Target
Abstract: In recent years, with the development of large-scale flat panel display, the requirements of ITO target size and density are higher and higher, and hot pressing equipment and technology are far from meeting their requirements. Therefore, the production of large-scale and high-density ITO targets by sintering process has become the focus of research and development of major target manufacturers in China. After a long time of development, the quality and cost of LCD products have been improved and the requirements for ITO target materials have been improved.
Preparation of ITO Sputtering Target by Slurry Casting Forming Atmosphere Sintering
Abstract: ITO sputtering target, namely indium tin oxide target, is coated with a transparent and conductive ITO film, on glass substrate or organic film by magnetron sputtering. ITO sputtering target can be prepared by many methods. One of them is the law of sintering in powder casting forming atmosphere.