Thin Film Substrate
What are the Preparations for Sputtering Target Before Use?
Abstract: Magnetron sputtering is a new type of physical vapor deposition. The electron gun system is used to shoot and focus the electrons on the material to be plated, making the sputtering atoms follow the principle of momentum conversion and fly away from the material with high kinetic energy to the substrate to form a film. This kind of material is called sputtering target. Today, I'd like to talk with you about some preparations before sputtering.
Application and Introduction of Sputtering Target for Optical Devices
Abstract: High purity sputtering target mainly refers to the metal or non-metal sputtering target with purity of 99.9% - 99.9999% (3N-6N). It can be used in the fields of integrated circuit, flat panel display, solar cell, magnetic recording media, optical devices, etc. The sputtering target of optical devices is used for optical coating to change the characteristics of light conduction. So what are the sputtering targets for optical devices?
Application and Introduction of Sputtering Target for Solar Thin Film Battery
Abstract: Sputtering target material is the raw material for preparing sputtering deposited films. It can be used in integrated circuit, flat panel display, solar cell, information storage, optical devices and other fields. Among them, the sputtering target material for solar thin film battery is the sputtering target material used to form the back electric level of solar thin film battery.
Application and Introduction of Sputtering Target for Flat Panel Display
Abstract: Sputtering target has a wide range of applications. The industries with a large amount of sputtering targets are mainly concentrated in the fields of integrated circuit, flat panel display, solar cell, magnetic recording media, optical devices, etc.
Application and Introduction of Sputtering Target for Semiconductor Chip
Abstract: Semiconductor chips have high technical requirements and high prices for sputtered targets. Their requirements for the purity and technology of sputtered targets are higher than those of flat panel displays, solar cells and other applications. Semiconductor chips set extremely strict standards for the purity of sputtering target metal materials, internal microstructure and other aspects. If the impurity content of sputtering target is too high, the film formed can't meet the electrical performance required by use, and in the sputtering process, it is easy to form particles on the wafer, resulting in short circuit or damage of the circuit, which will seriously affect the performance of the film. Generally speaking, the chip manufacturing requires the highest purity of sputtering target meta
Cerium Hexaboride Sputtering Target Video (CeB6)
Abstract: Cerium Hexaboride Sputtering Target.Brand: AEM Deposition Purity: 99.5%. Size: Dia 2 inch, THICK 6 mm.
Lanthanum Hexaboride Sputtering Target Video (LaB6)
Abstract: Lanthanum Hexaboride Sputtering Target.Brand: AEM Deposition.Purity: 99.5%. Size:Dia 2 inch, THICK 6 mm
Characteristics and Application of Titanium
Abstract: Titanium metal has the characteristics of very high strength, excellent corrosion resistance, difficult to cold work, good weldability, about 40% lighter than steel, 60% heavier than aluminum, low conductivity, low thermal expansion rate, high melting point, etc. High purity titanium can be made into all kinds of pure titanium products. Such as titanium powder, titanium rod, titanium plate, titanium tube and so on. The details are as follows:
Characteristics and Application of Chromium Metal
Abstract: Chromium is often used as a chromium coating. Chromium plating process is generally divided into three types: decorative coating, hard chromium coating and black chromium coating. The decorative chromium coating is usually plated on the outside of the nickel layer as the top layer, and the coating has a delicate polishing effect like a mirror. As a decorative post-treatment process, the thickness of chromium coating is only 0.006 mm. The sputtering targets commonly used for chromium coating are as follows:
Characteristics and Application of Aluminum
Abstract: The application history of aluminum is relatively short, but the output of aluminum products on the market has far exceeded the total of other non-ferrous products. In the high-tech field, the application of aluminum products is everywhere. For example, spherical aluminum powder in aluminum powder can be applied to 3D printing. High purity aluminum can also be used as evaporation material of aluminum block, aluminum sputtering target, aluminum alloy sputtering target etc.
Characteristics, Application and Introduction of Cast Iron
Abstract: Cast iron is the name for a mixture of many elements, including carbon, silicon and iron (hence, iron powder is often used). The higher the carbon content is, the better the flow characteristics will be. Here, carbon is in the form of graphite and iron carbide (carbon can also be used to make graphite crucibles).
Vanadium Sputtering Target Video (V)
Abstract: Vanadium Sputtering Target. Brand: AEM Deposition. Purity: 99.9%. Size: Dia 3 inch, THK 0.25 inch