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AEM Deposition
Lanthanum Hexaboride Sputtering Target Video (LaB6)

Lanthanum Hexaboride Sputtering Target Video (LaB6)

Date: 2021-01-22

Keywords: Lanthanum,Hexaboride,Sputtering,Target,Video,LaB6,Lanthanum,

Abstract: Lanthanum Hexaboride Sputtering Target.Brand: AEM Deposition.Purity: 99.5%. Size:Dia 2 inch, THICK 6 mm

Characteristics and Application of Titanium

Characteristics and Application of Titanium

Date: 2021-01-22

Keywords: Characteristics,and,Application,Titanium,Titanium,very,

Abstract: Titanium metal has the characteristics of very high strength, excellent corrosion resistance, difficult to cold work, good weldability, about 40% lighter than steel, 60% heavier than aluminum, low conductivity, low thermal expansion rate, high melting point, etc. High purity titanium can be made into all kinds of pure titanium products. Such as titanium powder, titanium rod, titanium plate, titanium tube and so on. The details are as follows:

Characteristics and Application of Chromium Metal

Characteristics and Application of Chromium Metal

Date: 2021-01-22

Keywords: Characteristics,and,Application,Chromium,Metal,Chromium,

Abstract: Chromium is often used as a chromium coating. Chromium plating process is generally divided into three types: decorative coating, hard chromium coating and black chromium coating. The decorative chromium coating is usually plated on the outside of the nickel layer as the top layer, and the coating has a delicate polishing effect like a mirror. As a decorative post-treatment process, the thickness of chromium coating is only 0.006 mm. The sputtering targets commonly used for chromium coating are as follows:

Characteristics and Application of Aluminum

Characteristics and Application of Aluminum

Date: 2021-01-22

Keywords: Characteristics,and,Application,Aluminum,Aluminum,white,

Abstract: The application history of aluminum is relatively short, but the output of aluminum products on the market has far exceeded the total of other non-ferrous products. In the high-tech field, the application of aluminum products is everywhere. For example, spherical aluminum powder in aluminum powder can be applied to 3D printing. High purity aluminum can also be used as evaporation material of aluminum block, aluminum sputtering target, aluminum alloy sputtering target etc.

Characteristics, Application and Introduction of Cast Iron

Characteristics, Application and Introduction of Cast Iron

Date: 2021-01-22

Keywords: Characteristics,Application,and,Introduction,Cast,Iron,Cast,

Abstract: Cast iron is the name for a mixture of many elements, including carbon, silicon and iron (hence, iron powder is often used). The higher the carbon content is, the better the flow characteristics will be. Here, carbon is in the form of graphite and iron carbide (carbon can also be used to make graphite crucibles).

Vanadium Sputtering Target Video (V)

Vanadium Sputtering Target Video (V)

Date: 2021-01-22

Keywords: Vanadium,Sputtering,Target,Video,Vanadium,Sputtering,Target,

Abstract: Vanadium Sputtering Target. Brand: AEM Deposition. Purity: 99.9%. Size: Dia 3 inch, THK 0.25 inch

Titanium Sputtering Target Video (Ti)

Titanium Sputtering Target Video (Ti)

Date: 2021-01-22

Keywords: Titanium Sputtering Target, Titanium Sputtering Target Video

Abstract: Titanium Sputtering Target.Brand: AEM Deposition.Purity: 99.5%.Size: Dia 95 mm, THK 44 mm

Zirconium Sputtering Target Video (Zr)

Zirconium Sputtering Target Video (Zr)

Date: 2021-01-22

Keywords: Zirconium Sputtering Target, Zirconium Sputtering Target Video

Abstract: Zirconium Sputtering Target.Brand: AEM Deposition.Purity: 99.5%. Size: Dia 95 mm, THK 44 mm

Titanium Aluminum Sputtering Target Video (Ti-Al)

Titanium Aluminum Sputtering Target Video (Ti-Al)

Date: 2021-01-22

Keywords: Titanium Aluminum Sputtering Target, Titanium Aluminum Sputtering Target Video

Abstract: Titanium Aluminum Sputtering Target. Brand: AEM Deposition. Purity: 99.8%.Composition: Ti/Al 40/60 at%.Size: Dia 95 mm, THK 44 mm

Surface Treatment Process of Physical Vapor Deposition (Attached Figure)

Surface Treatment Process of Physical Vapor Deposition (Attached Figure)

Date: 2021-01-22

Keywords: Physical,Vapor,Deposition,Surface,Treatment,Process,

Abstract: The main methods of PVD are vacuum evaporation, sputtering, arc plasma, ion and MBE. At present, physical vapor deposition technology can deposit metal films, alloy films, compounds, ceramics, semiconductors, polymer films, etc. So, what is the process of physical vapor deposition? Look directly at the following figure:

Application of Chemical Vapor Deposition in Semiconductor Films

Application of Chemical Vapor Deposition in Semiconductor Films

Date: 2021-01-22

Keywords: Application,Chemical,Vapor,Deposition,Semiconductor,Films,

Abstract: Chemical vapor deposition (CVD) is a well-known technology in the field of nano manufacturing. Through the use of gas-to-gas reactions, CVD can deposit evaporated reactants on the surface to form thin films. Therefore, CVD can be applied to semiconductor films.

Principle of Chemical Vapor Deposition (CVD)

Principle of Chemical Vapor Deposition (CVD)

Date: 2021-01-22

Keywords: Principle,Chemical,Vapor,Deposition,CVD,Chemical,vapor,

Abstract: Chemical vapor deposition (CVD) is a well-known technology in the field of nano manufacturing, which is often used in large-scale integrated circuits, insulating materials, magnetic materials, optoelectronic materials. Chemical vapor deposition (CVD) can deposit evaporated reactants on the surface to form thin films, for example, graphene is the most widely recognized product of CVD. So, what is the principle of CVD?