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  • Ta2O5 doped HfO2 Sputtering Target Video

    Ta2O5 doped HfO2 Sputtering Target Video

    Date: 2021-09-16

    Keywords: Ta2O5,doped,HfO2,Sputtering,Target,Video,Ta2O5,doped,HfO2,

    Abstract: Ta2O5 doped HfO2 Sputtering Target. 6.0 at% Ta2O5 doped HfO2. Brand: AEM Deposition. Purity: 99.95%. Diameter: 1 inch.Thickness: 0.125 inch

    Y2O3 doped HfO2 Sputtering Target Video

    Y2O3 doped HfO2 Sputtering Target Video

    Date: 2021-09-16

    Keywords: Y2O3,doped,HfO2,Sputtering,Target,Video,Y2O3,doped,HfO2,

    Abstract: Y2O3 doped HfO2 Sputtering Target. 6.0 at% Y2O3 doped HfO2. Brand: AEM Deposition. Purity: 99.95%. Diameter: 1 inch Thickness: 0.125 inch

    Tungsten Sputtering Target (W) Video

    Tungsten Sputtering Target (W) Video

    Date: 2021-09-16

    Keywords: Tungsten,Sputtering,Target,Video,Tungsten,Sputtering,Target,

    Abstract: Tungsten Sputtering Target. Brand: AEM Deposition. Purity: 99.95%. Diameter: 57 mm. Thickness: 1.5 mm

    Titanium Sputtering Target (Ti) Video

    Titanium Sputtering Target (Ti) Video

    Date: 2021-09-09

    Keywords: Titanium,Sputtering,Target,Video,Titanium,Sputtering,Target,

    Abstract: Titanium Sputtering Target. Brand: AEM Deposition. Purity: 99.995%. Diameter: 57 mm. Thickness: 1.5 mm

    Tantalum Sputtering Target (Ta) Video

    Tantalum Sputtering Target (Ta) Video

    Date: 2021-09-15

    Keywords: Tantalum,Sputtering,Target,Video,Tantalum,Sputtering,Target,

    Abstract: Tantalum Sputtering Target. Brand: AEM Deposition. Purity: 99.95%. Diameter: 57 mm. Thickness: 0.1 mm

    ITO Sputtering Target (Indium Tin Oxide) Video

    ITO Sputtering Target (Indium Tin Oxide) Video

    Date: 2021-09-15

    Keywords: ITO Sputtering Target

    Abstract: ITO Sputtering Target (In2O3/SnO2 90/10 wt%) .Brand: AEM Deposition. Purity: 99.99%. Density: 7.13g/cm3. Size: 200mm x 65mm x 6mm. Indium bonded to a 200mm x 65mm x 1.6mm Cu backing plate.

    Molybdenum Crucible (Mo) Video

    Molybdenum Crucible (Mo) Video

    Date: 2021-09-16

    Keywords: Molybdenum,Crucible,Video,

    Abstract: Molybdenum Crucible: Purity: 99.5%~99.99%; Surface: Finish turning, polishing; Density: 10.10 g/cm3; Melting Point: 2630℃. Application: Laboratory uses, metallurgy industry, mechanism process industry, crystalloid materials, and other burgeoning high technology industry.

    Application of Superfine Copper Powder

    Application of Superfine Copper Powder

    Date: 2021-09-21

    Keywords: Application of Superfine Copper Powder

    Abstract: Copper powder is a kind of metal powder with red luster. It can be widely used in powder metallurgy, electric carbon products, electronic materials, metal coatings, chemical catalysts, filters, heat pipes and other mechanical and electrical parts and electronic aviation fields. Superfine copper powder refers to copper powder with smaller particle diameter and finer particle size.

    Antimony(Sb) Sputtering Target Price? How Much does the Antimony Target Cost?

    Antimony(Sb) Sputtering Target Price? How Much does the Antimony Target Cost?

    Date: 2021-09-22

    Keywords: antimony sputtering target price, Sb sputtering target price

    Abstract: How much does the antimony sputtering target cost? For this question, AEM Deposition tells you that the antimony sputtering target’s price is always variable, because different countries and companies have diffenrent price. If you want to know the latest price of antimony sputtering targets, you’d better write an email or send an inquiry to the sputtering target manufacturer and supplier.

    Aluminum Sputtering Target Price? How Much does the Al Target Cost?

    Aluminum Sputtering Target Price? How Much does the Al Target Cost?

    Date: 2021-09-21

    Keywords: aluminum sputtering target price,aluminum sputtering target cost,Al sputtering target price

    Abstract: How about the aluminum sputtering target price? How much does the aluminum sputtering target cost? For this question, AEM Deposition tells you that the aluminum sputtering target’s price is always variable, because different country and different company have diffenrent price.

    The target bonding methods are recommended for sputtering targets/ Indium bonding vs elastomer bondin

    The target bonding methods are recommended for sputtering targets/ Indium bonding vs elastomer bondin

    Date: 2021-09-21

    Keywords: Indium bonding, elastomer bonding, sputtering target, backing plate

    Abstract: Most sputtering targets can be Indium bonded, because indium bonding has lot of advantages for good thermal conductivity and the backing plate can be reused.While, AEM recommended using elastomer bonding for some targets which is fragile, sensitive to temperature and has low density, such as Tin oxide (SnO2) and some lithium battery materials targets.

    Lost Art - Powder Metallurgy

    Lost Art - Powder Metallurgy

    Date: 2021-09-21

    Keywords: powder metallurgy, metal powder

    Abstract: Powder metallurgy was formerly known as lost art. Not like clay or other stoneware materials, the skills in molding and firing useful and ornamental metallic objects were seldom applied in the early phases of history.