Yttrium Fluoride Sputtering Target (YF3)
| Material Type | Yttrium Fluoride |
| Symbol | YF3 |
| Color/Appearance | White, Solid |
| Melting Point (°C) | 1,387 |
| Theoretical Density (g/cc) | 4.01 |
| Sputter | RF |
| Type of Bond | Indium, Elastomer |
Yttrium Fluoride Sputtering Targets
Yttrium fluoride sputtering target is a type of ceramic sputtering target, which is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coatings.
Yttrium Fluoride Sputtering Targets Information
Yttrium Fluoride Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Yttrium Fluoride Sputtering Targets
Applications• Chemical Vapor Deposition (CVD)• Physical Vapor Deposition (PVD) • Semiconductor • Optical |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.9% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Yttrium Fluoride Sputtering Targets
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N/A
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Ceramic Sputtering Targets |
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Evaporation Materials Yttrium Fluoride Pellet Evaporation Material (YF3) |
Crucibles N/A |
Metal Powders N/A |
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