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AEM Deposition

Calcium Phosphate Tribasic Sputtering Targets (Ca10 (OH)2 (PO4)6)

Calcium Phosphate Tribasic Sputtering Targets (Ca10 (OH)2 (PO4)6)
Calcium Phosphate Tribasic Sputtering Targets (Ca10 (OH)2 (PO4)6)
Material Type Calcium Phosphate Tribasic
Symbol (Ca10 (OH)2 (PO4)6)
Color/Appearance Crystalline
Melting Point (°C) 1100
Density  N/A
Molecular Weight 502.31
Exact Mass 501.675955


The monophasic Ca10(PO4)6(OH)2 samples were obtained by calcination of precursor gels for 5 h at 1000 °C. The phase transformations, composition and micro-structural features in the polycrystalline samples were studied by thermoanalytical methods (TGA/DTA), infrared spectroscopy (IR), X-ray powder diffraction analysis (XRD) and scanning electron microscopy (SEM). It was shown that adjusting the nature of complexing agent in the aqueous sol–gel processing can be used to control the morphology of the ceramic samples.

Material Notes

Calcium Phosphate Tribasic Sputtering Target, Purity is 99.99%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.


Other Information of Calcium Phosphate Tribasic Sputtering Targets

• Gate Dielectric

• For CMOS

• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

99.9% ex Strontium Minimum Purity

•Up to 12'' Diameter Targets Available

•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

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