Gallium Oxide Sputtering Targets (Ga2O3)
| Material Type | Gallium Oxide |
| Symbol | Ga2O3 |
| Color/Appearance | White Target |
| Melting Point (°C) | 1900 |
| Density | 5.88 g/cm3 |
| Molecular Weight | 187.44 |
| Sputter | |
| Exact Mass | 187.835 g/mol |
Gallium Oxide Sputtering Targets
Gallium oxide (Ga2O3) is emerging as a viable candidate for certain classes of power electronics, solar-blind UV photodetectors, solar cells, and sensors with capabilities beyond existing technologies due to its large bandgap. There are five different polymorphs of Ga2O3. Named as the monoclinic (β-Ga2O3), rhombohedral (α), defective spinel (γ), cubic (δ), or orthorhombic (ε) structures. Among all of these, the β-polymorph is the stable form under normal conditions and has been the most widely studied and utilized.
Gallium Oxide Sputtering Targets Information
Gallium Oxide Sputtering Targets
Purity: 99.99%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Gallium Oxide Sputtering Targets
Applications• Ferroelectric• Gate Dielectric • For CMOS |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.99% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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