Home > Products > Sputtering Targets > Ceramic Oxide Sputtering Targets > IGZO Sputtering Targets (InGaZnO4)

IGZO Sputtering Targets (InGaZnO4)

Material Type	Indium Gallium Zinc Oxide
Symbol	IGZO, InGaZnO₄, In₂Ga₂ZnO₇
Color/Appearance	White/Beige/Grey/Green, Solid
Melting Point (°C)	N/A

Theoretical Density (g/cc)	InGaZnO₄ 6.12, In₂Ga₂ZnO₇ 6.5
Z Ratio	N/A
Sputter	RF, DC
Max Power Density* (Watts/Square Inch)
Type of Bond	Indium, Elastomer
Comments

IGZO Sputtering Targets

Indium Gallium Zinc Oxide (IGZO) is a semiconducting material, consisting of indium (In), gallium (Ga), zinc (Zn) and oxygen (O), High-mobility indium gallium zinc oxide (IGZO) thin-film transistors (TFTs) are achieved through low-temperature crystallization enabled via a reaction with a transition metal catalytic layer. IGZO's advantage over zinc oxide is that it can be deposited as a uniform amorphous phase while retaining the high carrier mobility common to oxidesemiconductors.

IGZO Sputtering Targets Information

Indium Gallium Zinc Oxide Sputtering Targets
Purity: 99.99%;
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm.
Relative Density > 90%

More Information on IGZO Sputtering Targets

Applications

• Transparent conductive flim
• Enabling LCDs

• MEMS displays

Features

• High purity
• Custom sizes available

Manufacturing Process

• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options

• 99.99% minimum purity

• Smaller sizes also available for R&D applications

• Sputtering target bonding service

Related Products of IGZO Sputtering Targets

Pure Metal Sputtering Targets Indium Sputtering Target Zinc Sputtering Target	Alloy Sputtering Targets Indium Antimony Sputtering Target Zinc Tin Sputtering Target Copper Zinc Sputtering Target	Ceramic Sputtering Targets Indium Aluminum Zinc Oxide Sputtering Target IGZO Sputtering Target Indium Iron Oxide Sputtering Target Indium Molybdenum Oxide Sputtering Target Indium Oxide Sputtering Target ITO Sputtering Target IZO Sputtering Target Indium Sulfide Sputtering Target Indium Selenide Sputtering Target Indium Selenide Sputtering Target AZO Sputtering Target Indium Aluminum Zinc Oxide Sputtering Target IGZO Sputtering Target IZO Sputtering Target Magnesium Zinc Oxide Sputtering Target GZO Sputtering Target AZO Sputtering Target Zinc Oxide doped with Magnesium Sputtering Target Zinc Oxide doped with Manganese Sputtering Target Zinc Oxide doped with Manganese Sputtering Target Zinc Oxide doped with Scandia Sputtering Target Zinc Oxide doped with Sodium Sputtering Target Zinc Oxide Sputtering Target Zinc Sulfide Sputtering Target Zinc Selenide Sputtering Target Zinc Telluride Sputtering Target
Evaporation Materials Indium Pellet ITO Pellet Indium(III) Sulfide Pellet Indium Telluride Pellet Indium(III) telluride Pellet Indium Selenium Pellet Indium(III) Selenide Pellet Indium Antimony Pellet Indium Antimony Pellet ZnIn2Te4 Pellet Zinc Pellet Zinc Oxide Pellet Zinc Sulfide Pellet Zinc Telluride Pellet Zinc selenide Pellet Zinc Selenide Pellet Zinc Arsenic Pellet Zinc Arsenic Pellet ZnIn2Te4 Pellet ZnxCd1-xTe Pellet	Crucibles N/A	Metal Powders Zinc Powder