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AEM Deposition

Praseodymium Oxide Sputtering Targets (Pr2O3)

Praseodymium Oxide Sputtering Targets (Pr2O3)
Praseodymium Oxide Sputtering Targets (Pr2O3)
Material Type Praseodymium Oxide
Symbol Pr2O3
Color/Appearance Light green
Melting Point (°C) 2183
Density  N/A
Molecular Weight 329.81
Exact Mass 329.800049


Praseodymium oxide, Pr2O3, produces medium-index film layers that are transparent throughout the visible region.The films are insoluble and hard. Praseodymium oxide films require an electron-beam source to reach evaporation temperature. Amorphous films can be deposited below 150° C substrate temperature. Above ~300° C, the films become crystalline.

Material Notes

Praseodymium Oxide Sputtering Target, Purity is 99.99%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.


Other Information of  Praseodymium Oxide Sputtering Targets

• Gate Dielectric

• For CMOS

• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

99.9% ex Strontium Minimum Purity

•Up to 12'' Diameter Targets Available

•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

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