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Magnesium Sputtering Targets (Mg)

Magnesium Sputtering Targets (Mg)
Material Type Magnesium
Symbol Mg
Atomic Weight 24.305
Atomic Number 12
Color/Appearance Silvery White, Metallic
Thermal Conductivity 160 W/m.K
Melting Point (°C) 649
Coefficient of Thermal Expansion 8.2 x 10-6/K
Theoretical Density (g/cc) 1.74
Z Ratio 1.61
Sputter DC
Max Power Density*
(Watts/Square Inch)
50
Type of Bond Indium, Elastomer
Export Control (ECCN) 1C228
Comments Extremely high rates possible.

General

Magnesium is a chemical element with symbol Mg and atomic number 12. It is a shiny gray solid which bears a close physical resemblance to the other five elements in the second column (group 2, or alkaline earth metals) of the periodic table: all group 2 elements have the same electron configuration in the outer electron shell and a similar crystal structure.

Material Notes

Magnesium Sputtering Targets, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. This is an Export Controlled Material. Restrictions may apply.
 


Other Information of Boron Sputtering Targets

Applications
Electronics
• Semiconductor
• Flat panel displays
Features
Competitive pricing
• High purity
• Grain refined, engineered microstructure
• Semiconductor grade

Manufacturing Process
Refining
  Three-layer electrolytic process
• Melting and casting
  Electrical resistance furnace - Semi-continuous casting
• Grain refinement
  Thermomechanical treatment
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment
Options
99.999% minimum purity
• Semiconductor grade aluminum alloys available
  Al/Si,Al/Cu,Al/Cu/Si
• Planar circular targets up to 18'' (457mm) diameter
• Planar tiles up to 48ײ (1200mm) X 15.75ײ (400mm) for larger target configurations
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
 
 
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