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Zinc Oxide doped with Magnesium Sputtering Targets (Zn0.9Mg0.1O)

Zinc Oxide doped with Magnesium Sputtering Targets (Zn0.9Mg0.1O)
Material Type Zinc Oxide doped with Magnesium
Symbol Zn0.9Mg0.1O
Color/Appearance Various colors, Solid
Melting Point (°C) N/A
Relative Density (g/cc) >95%
Water Solubility Insoluble
Sputter RF, RF-R, DC
Type of Bond Indium, Elastomer
Comments Various composition available

General

Magnesium-doped zinc oxide (Zn0.9Mg0.1O) (ZMO) nanoparticles have been synthesized by auto-combustion method. The variation in particle size of these nanoparticles has been performed by their further calcination at 800 and 1000 °C for 2 h. The values of surface roughness of different additives are in good agreement with their observed tribological behavior.

Material Notes

Zinc Oxide doped with Magnesium Sputtering Target, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.

 
 


Other Information of Zinc Oxide doped with Magnesium Sputtering Targets

Applications
  Ferroelectric
• Gate Dielectric

• For CMOS

Features
• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
• 99.9% ex Strontium Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 
 
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