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AEM Deposition

Thulium Sputtering Targets (Tm)

Thulium Sputtering Targets (Tm)
Thulium Sputtering Targets (Tm)
Material Type Thulium
Symbol Tm
Molecular Weight 168.93
Color/Appearance Silvery 
Thermal Conductivity 0.169 W/cm/K 
Melting Point (°C) 1545
Coefficient of Thermal Expansion 13.3 µm/(m·K)
Theoretical Density (g/cc) 6.49
sputter DC
Density 9321 kg/m3
 Type of Bond  Indium, Elastomer
UN Number 3208


Thulium is a chemical element with symbol Tm and atomic number 69. It is the thirteenth and third-last element in the lanthanide series. Like the other lanthanides, the most common oxidation state is +3, seen in its oxide, halides and other compounds; because it occurs so late in the series, however, the +2 oxidation state is also stabilized by the nearly full 4f shell that results. In aqueous solution, like compounds of other late lanthanides, soluble thulium compounds form coordination complexes with nine water molecules.

Material Notes

Thulium Sputtering Target, purity is 99.9%. Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. 

Other Information of Thulium Sputtering Targets

• Semiconductor
• Flat panel displays
Competitive pricing
• High purity
• Grain refined, engineered microstructure
• Semiconductor grade

Manufacturing Process
  Three-layer electrolytic process
• Melting and casting
  Electrical resistance furnace - Semi-continuous casting
• Grain refinement
  Thermomechanical treatment
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment
• Planar circular targets up to 18'' (457mm) diameter
• Planar tiles up to 48''(1200mm) X 15.75''(400mm) for larger target configurations
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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