Vanadium Sputtering Target Video (V)

Date: 2021-01-22

Keywords: Vanadium,Sputtering,Target,Video,Vanadium,Sputtering,Target,

Abstract: Vanadium Sputtering Target. Brand: AEM Deposition. Purity: 99.9%. Size: Dia 3 inch, THK 0.25 inch

Titanium Sputtering Target Video (Ti)

Date: 2021-01-22

Keywords: Titanium Sputtering Target, Titanium Sputtering Target Video

Abstract: Titanium Sputtering Target.Brand: AEM Deposition.Purity: 99.5%.Size: Dia 95 mm, THK 44 mm

Zirconium Sputtering Target Video (Zr)

Date: 2021-01-22

Keywords: Zirconium Sputtering Target, Zirconium Sputtering Target Video

Abstract: Zirconium Sputtering Target.Brand: AEM Deposition.Purity: 99.5%. Size: Dia 95 mm, THK 44 mm

Titanium Aluminum Sputtering Target Video (Ti-Al)

Date: 2021-01-22

Keywords: Titanium Aluminum Sputtering Target, Titanium Aluminum Sputtering Target Video

Abstract: Titanium Aluminum Sputtering Target. Brand: AEM Deposition. Purity: 99.8%.Composition: Ti/Al 40/60 at%.Size: Dia 95 mm, THK 44 mm

Surface Treatment Process of Physical Vapor Deposition (Attached Figure)

Date: 2021-01-22

Keywords: Physical,Vapor,Deposition,Surface,Treatment,Process,

Abstract: The main methods of PVD are vacuum evaporation, sputtering, arc plasma, ion and MBE. At present, physical vapor deposition technology can deposit metal films, alloy films, compounds, ceramics, semiconductors, polymer films, etc. So, what is the process of physical vapor deposition? Look directly at the following figure:

Application of Chemical Vapor Deposition in Semiconductor Films

Date: 2021-01-22

Keywords: Application,Chemical,Vapor,Deposition,Semiconductor,Films,

Abstract: Chemical vapor deposition (CVD) is a well-known technology in the field of nano manufacturing. Through the use of gas-to-gas reactions, CVD can deposit evaporated reactants on the surface to form thin films. Therefore, CVD can be applied to semiconductor films.

Principle of Chemical Vapor Deposition (CVD)

Date: 2021-01-22

Keywords: Principle,Chemical,Vapor,Deposition,CVD,Chemical,vapor,

Abstract: Chemical vapor deposition (CVD) is a well-known technology in the field of nano manufacturing, which is often used in large-scale integrated circuits, insulating materials, magnetic materials, optoelectronic materials. Chemical vapor deposition (CVD) can deposit evaporated reactants on the surface to form thin films, for example, graphene is the most widely recognized product of CVD. So, what is the principle of CVD?

How to Test the Hardness of Ceramic Materials?

Date: 2021-01-22

Keywords: How,Test,the,Hardness,Ceramic,Materials,many,fields,can,see,

Abstract: The hardness test is the key to check the mechanical strength of ceramic workpieces which are easily affected by wear. For example, the hardness of bearing parts has a great impact on its performance - because the hardness of the bearing will affect its wear resistance, and the wear caused by the poor wear resistance will lead to the precision of precision machinery greatly re

Scandium Sputtering Target (Sc) Video

Date: 2021-01-22

Keywords: Scandium,Sputtering,Target,Video,Scandium,Sputtering,Target,

Abstract: Scandium Sputtering Target.Brand: AEM Deposition. Purity: 99.99% REM. Size: 0.1 x 100 x 105 mm. Application: • To produce scandium alloys. • Application in new lightning source. • Reagent for other compounds.• Application in laser

Titanium Dioxide Sputtering Target (TiO2) Video

Date: 2021-01-22

Keywords: Titanium,Dioxide,Sputtering,Target,TiO2,Video,Titanium,

Abstract: TiO2 Sputtering Target. Brand: AEM Deposition. Purity: 99.99%. Diameter: Φ40 x 50 mm. Application:• Decorative coating. • Flat Panel Displays. • Low-E Glass industry

Fe2O3 doped HfO2 Sputtering Target Video

Date: 2021-01-22

Keywords: Fe2O3,doped,HfO2,Sputtering,Target,Video,Fe2O3,doped,HfO2,

Abstract: Fe2O3 doped HfO2 Sputtering Target. 6.0 at% Fe2O3 doped HfO2. Brand: AEM Deposition. Purity: 99.95%. Diameter: 1 inch. Thickness: 0.125 inch

HfO2 doped Ta2O5 Sputtering Target Video

Date: 2021-01-22

Keywords: HfO2,doped,Ta2O5,Sputtering,Target,Video,HfO2,doped,Ta2O5,

Abstract: HfO2 doped Ta2O5 Sputtering Target. 6.0 at% HfO2 doped Ta2O5. Brand: AEM Deposition. Purity: 99.95%. Diameter: 1 inch. Thickness: 0.125 inch