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AEM Deposition
How to Test the Hardness of Ceramic Materials?

How to Test the Hardness of Ceramic Materials?

Date: 2021-01-22

Keywords: How,Test,the,Hardness,Ceramic,Materials,many,fields,can,see,

Abstract: The hardness test is the key to check the mechanical strength of ceramic workpieces which are easily affected by wear. For example, the hardness of bearing parts has a great impact on its performance - because the hardness of the bearing will affect its wear resistance, and the wear caused by the poor wear resistance will lead to the precision of precision machinery greatly re

Scandium Sputtering Target (Sc) Video

Scandium Sputtering Target (Sc) Video

Date: 2021-01-22

Keywords: Scandium,Sputtering,Target,Video,Scandium,Sputtering,Target,

Abstract: Scandium Sputtering Target.Brand: AEM Deposition. Purity: 99.99% REM. Size: 0.1 x 100 x 105 mm. Application: • To produce scandium alloys. • Application in new lightning source. • Reagent for other compounds.• Application in laser

Titanium Dioxide Sputtering Target (TiO2) Video

Titanium Dioxide Sputtering Target (TiO2) Video

Date: 2021-01-22

Keywords: Titanium,Dioxide,Sputtering,Target,TiO2,Video,Titanium,

Abstract: TiO2 Sputtering Target. Brand: AEM Deposition. Purity: 99.99%. Diameter: Φ40 x 50 mm. Application:• Decorative coating. • Flat Panel Displays. • Low-E Glass industry

Fe2O3 doped HfO2 Sputtering Target Video

Fe2O3 doped HfO2 Sputtering Target Video

Date: 2021-01-22

Keywords: Fe2O3,doped,HfO2,Sputtering,Target,Video,Fe2O3,doped,HfO2,

Abstract: Fe2O3 doped HfO2 Sputtering Target. 6.0 at% Fe2O3 doped HfO2. Brand: AEM Deposition. Purity: 99.95%. Diameter: 1 inch. Thickness: 0.125 inch

HfO2 doped Ta2O5 Sputtering Target Video

HfO2 doped Ta2O5 Sputtering Target Video

Date: 2021-01-22

Keywords: HfO2,doped,Ta2O5,Sputtering,Target,Video,HfO2,doped,Ta2O5,

Abstract: HfO2 doped Ta2O5 Sputtering Target. 6.0 at% HfO2 doped Ta2O5. Brand: AEM Deposition. Purity: 99.95%. Diameter: 1 inch. Thickness: 0.125 inch

Ta2O5 doped HfO2 Sputtering Target Video

Ta2O5 doped HfO2 Sputtering Target Video

Date: 2021-01-22

Keywords: Ta2O5,doped,HfO2,Sputtering,Target,Video,Ta2O5,doped,HfO2,

Abstract: Ta2O5 doped HfO2 Sputtering Target. 6.0 at% Ta2O5 doped HfO2. Brand: AEM Deposition. Purity: 99.95%. Diameter: 1 inch.Thickness: 0.125 inch

Y2O3 doped HfO2 Sputtering Target Video

Y2O3 doped HfO2 Sputtering Target Video

Date: 2021-01-22

Keywords: Y2O3,doped,HfO2,Sputtering,Target,Video,Y2O3,doped,HfO2,

Abstract: Y2O3 doped HfO2 Sputtering Target. 6.0 at% Y2O3 doped HfO2. Brand: AEM Deposition. Purity: 99.95%. Diameter: 1 inch Thickness: 0.125 inch

Tungsten Sputtering Target (W) Video

Tungsten Sputtering Target (W) Video

Date: 2021-01-22

Keywords: Tungsten,Sputtering,Target,Video,Tungsten,Sputtering,Target,

Abstract: Tungsten Sputtering Target. Brand: AEM Deposition. Purity: 99.95%. Diameter: 57 mm. Thickness: 1.5 mm

Titanium Sputtering Target (Ti) Video

Titanium Sputtering Target (Ti) Video

Date: 2021-01-22

Keywords: Titanium,Sputtering,Target,Video,Titanium,Sputtering,Target,

Abstract: Titanium Sputtering Target. Brand: AEM Deposition. Purity: 99.995%. Diameter: 57 mm. Thickness: 1.5 mm

Tantalum Sputtering Target (Ta) Video

Tantalum Sputtering Target (Ta) Video

Date: 2021-01-22

Keywords: Tantalum,Sputtering,Target,Video,Tantalum,Sputtering,Target,

Abstract: Tantalum Sputtering Target. Brand: AEM Deposition. Purity: 99.95%. Diameter: 57 mm. Thickness: 0.1 mm

ITO Sputtering Target (Indium Tin Oxide) Video

ITO Sputtering Target (Indium Tin Oxide) Video

Date: 2021-01-22

Keywords: ITO Sputtering Target

Abstract: ITO Sputtering Target (In2O3/SnO2 90/10 wt%) .Brand: AEM Deposition. Purity: 99.99%. Density: 7.13g/cm3. Size: 200mm x 65mm x 6mm. Indium bonded to a 200mm x 65mm x 1.6mm Cu backing plate.

Comparison of DC Sputtering, Magnetron Sputtering and Sputtering Coating

Comparison of DC Sputtering, Magnetron Sputtering and Sputtering Coating

Date: 2021-01-22

Keywords: Comparison of DC Sputtering, Magnetron Sputtering and Sputtering Coating

Abstract: Sputtering is one of the main technologies for the preparation of thin film materials. It uses the ions generated by the ion source to accelerate the aggregation in vacuum, forming a high-speed ion beam flow, bombarding the solid surface, and the ion and the atoms on the solid surface exchange kinetic energy, so that the atoms on the solid surface are separated from the solid and deposited on the substrate surface. There are three sputtering technologies: DC sputtering, sputtering coating and DC magnetron sputtering.