Cadmium Oxide Sputtering Targets (CdO)
|Material Type||Cadmium Oxide|
|Melting Point (°C)||900-1000|
|Exact Mass||129.898 g/mol|
Highly conducting and transparent cadmium oxide films have been deposited on Corning 7059 glass substrates by ion-beam sputtering and by spray pyrolysis. The electrical and optical properties of CdO films prepared by the two techniques are similar.
Cadmium Oxide Sputtering Target, Purity is 99.99%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
Other Information of Cadmium Oxide Sputtering Targets
• Gate Dielectric
• For CMOS
• High purity
• Custom Sizes Available
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum,
• 99.9% ex Strontium Minimum Purity
•Up to 12'' Diameter Targets Available
•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations