Germanium Sputtering Targets (Ge)


Material Type | Germanium |
Symbol | Ge (N-type) |
Atomic Weight | 72.63 |
Atomic Number | 32 |
Color/Appearance | Grayish White, Semi-Metallic |
Thermal Conductivity | 60 W/m.K |
Melting Point (°C) | 937 |
Bulk Resistivity | 5-40 ohm-cm |
Coefficient of Thermal Expansion | 6 x 10-6/K |
Theoretical Density (g/cc) | 5.32 |
Dopant | Antimony |
Z Ratio | 0.516 |
Sputter | DC (doped), RF |
Max Power Density* (Watts/Square Inch) |
20 |
Type of Bond | Indium, Elastomer |
Comments | Excellent films from E-beam. |
Germanium Sputtering Targets
Germanium is a chemical element with the symbol Ge and atomic number 32. It is a lustrous, hard, grayish-white metalloid in the carbon group, chemically similar to its group neighbors tin and Silicon. Pure germanium is a semiconductor with an appearance similar to elemental Silicon. Germanium naturally reacts and forms complexes with oxygen in nature like Silicon. But unlike Silicon, it is too reactive to be found naturally on Earth in the free (elemental) state. The Germanium sputtering targets are widely used in semiconductor applications.
Germanium Sputtering Targets Information
Germanium Sputtering Targets
Purity: 99.99-99.999%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Germanium Sputtering Targets
Applications• Electronics• Semiconductor • Flat panel displays |
Features• Competitive pricing• High purity • Grain refined, Engineered microstructure • Semiconductor grade |
Manufacturing Process• RefiningThree-layer electrolytic process • Melting and casting Electrical resistance furnace - Semi-continuous casting • Grain refinement Thermomechanical treatment • Cleaning and final packaging - Cleaned for use in vacuum Protection from environmental contaminants Protection during shipment |
Options• 99.99% minimum purity• Smaller sizes also available for R&D applications • Sputtering target bonding service |
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Metal Powders N/A |
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