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Vanadium Sputtering Targets (V)

Vanadium Sputtering Targets (V)
Material Type Vanadium
Symbol V
Atomic Weight 50.9415
Atomic Number 23
Color/Appearance Silvery Gray Metallic
Thermal Conductivity 30.7 W/m.K
Melting Point (°C) 1,890
Coefficient of Thermal Expansion 8.4 x 10-6/K
Theoretical Density (g/cc) 5.96
Z Ratio 0.53
Sputter DC
Max Power Density*
(Watts/Square Inch)
Type of Bond Indium, Elastomer
Comments Wets Mo. E-beam-evaporated films preferred.


Vanadium is a medium-hard, ductile, steel-blue metal. It is harder than most metals and steels. Vanadium has good resistance to corrosion and it is stable against alkalis and sulfuric and hydrochloric acids. It is oxidized in air at about 933 K (660 ℃, 1220 ℉), although an oxide passivation layer forms even at room temperature. High-purity vanadium is used as a barrier in the integrated circuit to prevent diffusion between the gold conductive layer and the nickel bonding layer because vanadium have a high melting point and can withstand a large current density. Thus, the vanadium sputtering targets often used as the film material in integrated circuit. Some vanadium sputtering targets also as materials in surface coating. Besides, vanadium alloy targets (NiV) are widely used in solar film battery, electronic, semiconductor and construction glasses.

Material Notes

Purity: 99.5%-99.9%
Circular: Diameter <= 14inch, Thickness >= 1mm
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm
Targets Type: Planar sputtering target, Rotary sputtering target

Other Information of Vanadium Sputtering Targets

• Semiconductor

Surface coating
Competitive pricing
• High purity
• Grain refined, engineered microstructure
(the average grain size < 100 um)
• Semiconductor grade

Manufacturing Process
Melting (EB)
• Analysis (GDMS, ICP-OES, LECO)
• Grain refinement
  Thermomechanical treatment 
(Forging, Rolling, Annealing)
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment
99.5% minimum purity
• Vanadium alloys available, such as NiV
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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