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Vanadium Sputtering Targets (V)

Vanadium Sputtering Targets (V)
Material Type Vanadium
Symbol V
Atomic Weight 50.9415
Atomic Number 23
Color/Appearance Silvery Gray Metallic
Thermal Conductivity 30.7 W/m.K
Melting Point (°C) 1,890
Coefficient of Thermal Expansion 8.4 x 10-6/K
Theoretical Density (g/cc) 5.96
Z Ratio 0.53
Sputter DC
Max Power Density*
(Watts/Square Inch)
50
Type of Bond Indium, Elastomer
Comments Wets Mo. E-beam-evaporated films preferred.

General

Vanadium is a medium-hard, ductile, steel-blue metal. Some sources describe vanadium as "soft", perhaps because it is ductile, malleable and not brittle. Vanadium is harder than most metals and steels (see Hardnesses of the elements (data page) and iron). It has good resistance to corrosion and it is stable against alkalis and sulfuric and hydrochloric acids. It is oxidized in air at about 933 K (660 ℃, 1220 ℉), although an oxide passivation layer forms even at room temperature. Vanadium is a medium-hard, ductile, steel-blue metal. Some sources describe vanadium as "soft", perhaps because it is ductile, malleable and not brittle. Vanadium is harder than most metals and steels (see Hardnesses of the elements (data page) and iron). It has good resistance to corrosion and it is stable against alkalis and sulfuric and hydrochloric acids. It is oxidized in air at about 933 K (660 ℃ ,1220 ℉), although an oxide passivation layer forms even at room tempe.

Material Notes

Vanadium Sputtering Targets, Purity is 99.9%;Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
 


Other Information of Vanadium Sputtering Targets

Applications
Electronics
• Semiconductor
• Flat panel displays
Features
Competitive pricing
• High purity
• Grain refined, engineered microstructure
• Semiconductor grade

Manufacturing Process
Refining
  Three-layer electrolytic process
• Melting and casting
  Electrical resistance furnace - Semi-continuous casting
• Grain refinement
  Thermomechanical treatment
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment
Options
99.999% minimum purity
• Semiconductor grade aluminum alloys available
  Al/Si,Al/Cu,Al/Cu/Si
• Planar circular targets up to 18'' (457mm) diameter
• Planar tiles up to 48''(1200mm) X 15.75''(400mm) for larger target configurations
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
 
 
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