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Vanadium Carbide Sputtering Targets (VC)

Vanadium Carbide Sputtering Targets (VC)
Material Type Vanadium Carbide
Symbol VC
Melting Point (°C) 2,810
Theoretical Density (g/cc) 5.77
Z Ratio **1.00
Sputter RF
Type of Bond Indium, Elastomer

General

Vanadium carbide is the inorganic compound with the formula VC. It is an extremely hard refractory ceramic material. With a hardness of 9-9.5 Mohs, it is possibly the hardest metal-carbide known. It is of interest because it is prevalent in vanadium metal and alloys. Vanadium Carbide has an elastic modulus of approximately 380 GPa. Vanadium carbide (VC) thin films were deposited on silicon substrates by direct sputtering of a VC target in an argon atmosphere. 

Material Notes

Vanadium Carbide Sputtering Target, Purity is 99.5%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.This material may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.
 



Other Information of  Vanadium Carbide Sputtering Targets

Applications
  PVD and CVD display
• Semiconductor

• Optical

Features
• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
• 99% Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 
 
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