Nickel Iron Chromium Sputtering Targets (NiFe/Cr)

Nickel Iron Chromium Sputtering Targets

Nickel Iron Chromium Sputtering Targets(NiFe(80/20)/Cr40 at%)
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.

More Information on Nickel Iron Chromium Sputtering Targets

Applications • Semiconductor • Chemical Vapor Deposition (CVD) • Physical Vapor Deposition (PVD)	Features • Competitive pricing • High purity • Grain refined, Engineered microstructure • Semiconductor grade
Manufacturing Process • Refining   Three-layer electrolytic process • Melting and casting   Electrical resistance furnace - Semi-continuous casting • Grain refinement   Thermomechanical treatment • Cleaning and final packaging - Cleaned for use in vacuum   Protection from environmental contaminants   Protection during shipment	Options • 99.9% minimum purity • Smaller sizes also available for R&D applications • Sputtering target bonding service

Related Products of Nickel Iron Chromium Sputtering Targets

Pure Metal Sputtering Targets Nickel Sputtering Target Chromium Sputtering Target

Alloy Sputtering Targets Nickel Chromium Sputtering Target Rotatable Nickel Chromium Sputtering Target Planar Nickel Chromium Sputtering Target Nickel Aluminum Sputtering Target Nickel Chromium Aluminum Silicon Sputtering Target Nickel Iron Sputtering Target

Ceramic Sputtering Targets Nickel Oxide Sputtering Target Chromium Oxide Sputtering Target Neodymium Nickel Oxide Sputtering Target