Nickel Oxide Sputtering Target
Nickel(II) oxide is the chemical compound with the formula NiO. It is notable as being the only well-characterized oxide of nickel (although nickel(III) oxide, Ni2O3 and NiO2 have been claimed). The mineralogical form of NiO, bunsenite, is very rare. It is classified as a basic metal oxide. Several million kilograms are produced in varying quality annually, mainly as an intermediate in the production of nickel alloys.
Nickel Oxide Sputtering Target Information
Nickel(II) Oxide Sputtering Targets, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.This material may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.
We also have high quality pure niobium sputtering targets
with 99.995% purity for sale.
Other Information of Nickel Oxide Sputtering Target
• Gate Dielectric
• For CMOS
• High purity
• Custom Sizes Available
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment
• 99.9% ex Strontium Minimum Purity
•Up to 12'' Diameter Targets Available
•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations
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