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Chromium Sputtering Targets (Cr)

Chromium Sputtering Targets (Cr)
Material Type Chromium
Symbol Cr
Atomic Weight 51.9961
Atomic Number 24
Color/Appearance Silvery, Metallic
Thermal Conductivity 94 W/m.K
Melting Point (°C) 1,857
Coefficient of Thermal Expansion 4.9 x 10-6/K
Theoretical Density (g/cc) 7.2
Z Ratio 0.305
Sputter DC
Max Power Density*
(Watts/Square Inch)
80
Type of Bond Indium, Elastomer
Comments Films very adherent. High rates possible.

General

Chromium is a chemical element with symbol Cr and atomic number 24. It is the first element in group 6. It is a steely-grey, lustrous, hard and brittle metal which takes a high polish, resists tarnishing, and has a high melting point. The name of the element is derived from the Greek word, meaning color, because many chromium compounds are intensely colored. Chromium metal is of high value for its high corrosion resistance and hardness. It is obtained by the aluminium reduction of Cr2O3, the source of which is chromite, a double oxide of chromium and iron which generally also contains magnesium. It has an abundance within the earth's crust of approximately 100 ppm. Chromium is soluble in HCl and H2SO4, but not in H3PO4, HNO3 or HClO4 due to the formation of a stable and insoluble oxide layer on its surface; this, along with its hardness, has been used to advantage in the chromium plating of steel which has good corrosion resistance. Chromium is alloyed with nickel in the manufacture of heat resisting alloys, and with iron, or nickel and iron, to produce stainless and heat resistant steels.

Material Notes

Chromium Sputtering Targets, Purity is 99.95%;
Circular: Diameter <= 14inch, Thickness >= 1mm;
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
 


Other Information of Chromium Sputtering Targets

Applications
Electronics
• Semiconductor
• Flat panel displays
Features
Competitive pricing
• High purity
• Grain refined, engineered microstructure
• Semiconductor grade

Manufacturing Process
Refining
  Three-layer electrolytic process
• Melting and casting
  Electrical resistance furnace - Semi-continuous casting
• Grain refinement
  Thermomechanical treatment
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment
Options
99.95% minimum purity
• Semiconductor grade c
hromium compound targets
CrO3, Ni/Cr/Al/Si (54-37-6-3 wt%), CrSiO2, Cr2O3, CrN, Ni/Cr, CrSi2, CrSi
• Sputtering target bonding service
 
 
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