Chromium Oxide Sputtering Targets (Cr2O3)
Material Type | Chromium Oxide |
Symbol | Cr2O3 |
Color/Appearance | Green, Crystalline Solid |
Melting Point (°C) | 2,266 |
Theoretical Density (g/cc) | 5.21 |
Z Ratio | **1.00 |
Sputter | RF, RF-R |
Max Power Density* (Watts/Square Inch) |
20 |
Type of Bond | Indium, Elastomer |
Comments | Disproportionates to lower oxides; reoxidizes at 600°C in air. |
Chromium Oxide Sputtering Targets
Chromium(III) oxide is the inorganic compound of the formula Cr2O3. It is one of the principal oxides of Chromium and is used as a pigment. In nature, it occurs as the rare mineral eskolaite.
Chromium Oxide Sputtering Targets Information
Chromium Oxide Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm.
More Information on Chromium Oxide Sputtering Targets
Applications• Ferroelectric• Gate Dielectric • For CMOS
• Non-volatile memory
• Thin film capacitor
|
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.9% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
|
Related Products of Chromium Oxide Sputtering Targets
|
Ceramic Sputtering Targets Chromium Oxide Sputtering Target |
|
Evaporation Materials Chromium Evaporation Pellet |
Crucibles N/A |
Metal Powders Chromium Powder |
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