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AEM Deposition

Chromium Oxide Sputtering Targets (Cr2O3)

Chromium Oxide Sputtering Targets (Cr2O3)
Chromium Oxide Sputtering Targets (Cr2O3)
Material Type Chromium Oxide
Symbol Cr2O3
Color/Appearance Green, Crystalline Solid
Melting Point (°C) 2,266
Theoretical Density (g/cc) 5.21
Z Ratio **1.00
Sputter RF, RF-R
Max Power Density*
(Watts/Square Inch)
Type of Bond Indium, Elastomer
Comments Disproportionates to lower oxides; reoxidizes at 600°C in air.


Chromium(III) oxide is the inorganic compound of the formula Cr2O3. It is one of the principal oxides of chromium and is used as a pigment. In nature, it occurs as the rare mineral eskolaite.

Material Notes

Chromium Oxide Sputtering Targets, Purity is 99.9%;Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.

Other Information of Chromium Oxide Sputtering Targets

• Gate Dielectric

• For CMOS

• Non-volatile Memory
• Thin film capacitor


• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

99.9% ex Strontium Minimum Purity

•Up to 12'' Diameter Targets Available

•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

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