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    La0.8Sr0.2MnO3 Sputtering Target Video

    views, 2021/01/22
    La0.8Sr0.2MnO3 Sputtering Target https://www.aemdeposition.com/oxide-targets/la08sr02mno3-sputtering-target.html
    Details are as follows:
    La0.8Sr0.2MnO3 Sputtering Target
    Brand: AEM Deposition
    Purity: 3N 99.9%
    Size: Φ51 x 3 mm / Φ51 x 3 mm
     
    Applications
    - Ferroelectric;
    - Gate Dielectric;
    - For CMOS.
     
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