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La0.8Sr0.2MnO3 Sputtering Target Video
La0.8Sr0.2MnO3 Sputtering Target https://www.aemdeposition.com/oxide-targets/la08sr02mno3-sputtering-target.html
Details as follows:
La0.8Sr0.2MnO3 Sputtering Target
Brand: AEM Deposition
Purity: 3N 99.9%
Size: Φ51 x 3 mm / Φ51 x 3 mm
Applications
- Ferroelectric;
- Gate Dielectric;
- For CMOS.
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