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  • Preparation of ITO Sputtering Target by Vacuum Hot Pressing

    views, 2021/01/22
    ITO sputtering target is the main material for making transparent conductive films. ITO sputtering target can be prepared by hot pressing, cold isostatic pressing sintering, and hot isostatic pressing. Here we talk with you about the technology of preparing ITO sputtering target by vacuum hot pressing.
     
    The vacuum hot pressing method refers to the molding or isostatic pressing and both forming techniques. It uses heat and mechanical energy to densify the target. Because the heating process and pressure process are carried out simultaneously, it is helpful for the mass transfer process of powder particles such as diffusion contact and flows in the sintering process. The vacuum hot pressing method has the advantages of shortening the sintering period, reducing the sintering temperature, and effectively restraining the target material's grain size, greatly improving the target material's density.
     
    However, the vacuum hot pressing method also has some shortcomings. Due to thermal stress in the sintering process, the target body with large size is easy to crack, so the hot press's pressure and temperature field's uniformity and stability are required to be extremely high. Due to the large die loss and the reduction reaction with the target at high temperature, the mold material is required to be high. The homogeneity of the target microstructure is poor. The ITO target produced by the hot pressing method has a lack of oxygen. The high rate and uneven distribution of oxygen content affect ITO film production's uniformity and can not produce large-scale targets.
     
    As a sputtering target supplier and manufacturer in China, AEM Deposition can prepare rare earth metal and alloy sputtering targets by vacuum casting and pressure processing. The process is reasonable, and the product quality meets the characteristics of sputtering targets. Users at home and abroad have reported good results. We provide all kinds of pure metal sputtering targets, alloy sputtering targets, ceramic compound sputtering targets, and other targets. See the following list for details:
     
    Pure Metal Sputtering Target Alloy Sputtering Target Oxide Sputtering Target Sulfide Sputtering Target
    Boride Sputtering Target Carbide Sputtering Target Silicide Sputtering Target
    Telluride Sputtering Target Nitride Sputtering Target Fluoride Sputtering Target  

    If you need ITO sputtering target or other related sputtering targets, you can go to the sputtering target product page for more details. You can also email us directly for consultation. E-mail: [email protected]
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