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  • Preparation of ITO Sputtering Target by Vacuum Hot Pressing

    ITO sputtering target is the main material for making transparent conductive films. At present, ITO sputtering target can be prepared by hot pressing, cold isostatic pressing sintering and hot isostatic pressing. Today, I'd like to talk with you about the technology of preparing ITO sputtering target by vacuum hot pressing.
    The vacuum hot pressing method refers to the molding or isostatic pressing and both forming methods. It uses heat and mechanical energy to densify the target. Because the heating process and pressure process are carried out at the same time, it is helpful for the mass transfer process of powder particles such as diffusion contact and flow in the sintering process. The vacuum hot pressing method has the advantages of shortening the sintering period, reducing the sintering temperature and effectively restraining the grain size of the target material, which can greatly improve the density of the target material.
    However, the vacuum hot pressing method also has some shortcomings. Due to the existence of thermal stress in the sintering process, the target body with large size is easy to crack, so the uniformity and stability of the pressure and temperature field of the hot press are required to be extremely high; due to the large die loss and the reduction reaction with the target at high temperature, the mold material is required to be high; the homogeneity of the target microstructure is poor, and the ITO target produced by the hot pressing method is lack of oxygen The high rate and the uneven distribution of oxygen content affect the uniformity of ITO film production, and can not produce large-scale target.
    AEM Deposition, as a sputtering target supplier and manufacturer in China, can prepare rare earth metal and alloy sputtering targets by vacuum casting and pressure processing. The process is reasonable and the product quality meets the characteristics of sputtering targets. Users at home and abroad have reported good results. We can provide all kinds of pure metal sputtering targets, alloy sputtering targets, ceramic compound sputtering targets and other targets. See the following list for details:
    Pure Metal Sputtering Target Alloy Sputtering Target Oxide Sputtering Target Sulfide Sputtering Target
    Boride Sputtering Target Carbide Sputtering Target Silicide Sputtering Target
    Telluride Sputtering Target Nitride Sputtering Target Fluoride Sputtering Target  

    If you need ITO sputtering target or other related sputtering targets, you can go to the sputtering target product page for more details. You can also email us directly for consultation. E-mail: [email protected]