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Cerium Fluoride Sputtering Targets (CeF3)

Cerium Fluoride Sputtering Targets (CeF3)
Material Type Cerium Fluoride
Symbol CeF3
Color/Appearance White, Crystalline Solid
Melting Point (°C) 1,460
Theoretical Density (g/cc) 7.13
Z Ratio **1.00
Sputter RF
Max Power Density*
(Watts/Square Inch)
20
Type of Bond Indium, Elastomer
Comments Preheat gently to outgas. n~1.7

General

Cerium(III) fluoride (or cerium trifluoride), CeF3, is an ionic compound of the rare earth metal cerium and fluorine.It appears as a mineral in the form of fluocerite-(Ce-).

Material Notes

Cerium Fluoride Sputtering Target, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.  Indium bonding is recommended for this material, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity. This material has a low thermal conductivity are susceptible to thermal shock. 
 



Other Information of Cerium Fluoride Sputtering Targets

Applications
  PVD (physical vapor deposition) and CVD (chemical vapor) deposition display
• Semiconductor

• Optical

Features
• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
• 99% Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 
 
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