Thin Film Substrates
Characteristics and Application of Aluminum
Abstract: The application history of aluminum is relatively short, but the output of aluminum products on the market has far exceeded the total of other non-ferrous products. In the high-tech field, the application of aluminum products is everywhere. For example, spherical aluminum powder in aluminum powder can be applied to 3D printing. High purity aluminum can also be used as evaporation material of aluminum block, aluminum sputtering target, aluminum alloy sputtering target etc.
Characteristics, Application and Introduction of Cast Iron
Abstract: Cast iron is the name for a mixture of many elements, including carbon, silicon and iron (hence, iron powder is often used). The higher the carbon content is, the better the flow characteristics will be. Here, carbon is in the form of graphite and iron carbide (carbon can also be used to make graphite crucibles).
Incremental Method VS Decrement Method in Sample Weighing
Abstract: Sample weighing is an important part of the analysis experiment. The inaccurate weighing will lead to the failure of the whole experiment. Therefore, we should choose the right weighing method when weighing. Such as increment method and decrement method. When it comes to increment method and decrement method, what's the difference between them? How to choose?
Analysis of the Reasons for the Inaccurate Weighing of Samples in the Experiment
Abstract: Sample weighing is an important part of the analysis experiment. The inaccurate weighing will lead to the failure of the whole experiment. If we always say that we are not on time, we need to analyze the reasons in detail. Generally speaking, the reasons for the inaccurate weighing of samples can be divided into four aspects: the scale is not calibrated, the environment and the physical factors of the sample influence and improper operation etc.
Vanadium Sputtering Target Video (V)
Abstract: Vanadium Sputtering Target. Brand: AEM Deposition. Purity: 99.9%. Size: Dia 3 inch, THK 0.25 inch
Titanium Sputtering Target Video (Ti)
Keywords: Titanium Sputtering Target, Titanium Sputtering Target Video
Abstract: Titanium Sputtering Target.Brand: AEM Deposition.Purity: 99.5%.Size: Dia 95 mm, THK 44 mm
Zirconium Sputtering Target Video (Zr)
Keywords: Zirconium Sputtering Target, Zirconium Sputtering Target Video
Abstract: Zirconium Sputtering Target.Brand: AEM Deposition.Purity: 99.5%. Size: Dia 95 mm, THK 44 mm
Titanium Aluminum Sputtering Target Video (Ti-Al)
Keywords: Titanium Aluminum Sputtering Target, Titanium Aluminum Sputtering Target Video
Abstract: Titanium Aluminum Sputtering Target. Brand: AEM Deposition. Purity: 99.8%.Composition: Ti/Al 40/60 at%.Size: Dia 95 mm, THK 44 mm
Application of Silicon Nitride Ceramic Bearing, Substrate, Cutter and Bar
Abstract: Silicon nitride ceramic is a kind of ceramic with high strength, high hardness and high heat conduction by sintering (reaction sintering, pressureless sintering, hot pressing sintering, etc.). Silicon nitride ceramics have excellent heat shock resistance, wear resistance and corrosion resistance, which can be used in bearing, substrate, cutter and shell.
Comparison of Six Methods for Making Silicon Nitride Powder
Abstract: The basic principle of the preparation of silicon nitride powder is to produce silicon nitride powder with high purity and specific crystal phase (α phase or β phase) by chemical reaction between nitrogen compounds and silicon compounds under suitable temperature and atmosphere.
Surface Treatment Process of Physical Vapor Deposition (Attached Figure)
Abstract: The main methods of PVD are vacuum evaporation, sputtering, arc plasma, ion and MBE. At present, physical vapor deposition technology can deposit metal films, alloy films, compounds, ceramics, semiconductors, polymer films, etc. So, what is the process of physical vapor deposition? Look directly at the following figure:
Application of Chemical Vapor Deposition in Semiconductor Films
Abstract: Chemical vapor deposition (CVD) is a well-known technology in the field of nano manufacturing. Through the use of gas-to-gas reactions, CVD can deposit evaporated reactants on the surface to form thin films. Therefore, CVD can be applied to semiconductor films.