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  • Application and Introduction of Sputtering Target for Optical Devices

    High purity sputtering target mainly refers to the metal or non-metal sputtering target with purity of 99.9% - 99.9999% (3N-6N). It can be used in the fields of integrated circuit, flat panel display, solar cell, magnetic recording media, optical devices, etc. The sputtering target of optical devices is used for optical coating to change the characteristics of light conduction. So what are the sputtering targets for optical devices?
     
    Sputtering targets for optical devices
    The sputtering target of optical devices can change the transmission characteristics of light wave by using optical coating. Optical devices rely on optical coating to form one or more layers of dielectric film and metal film. The characteristics of light wave transmission, including light transmission, reflection, absorption, scattering, polarization and phase change, are changed by the film system composed of the two.
     
    In optical devices, the commonly used sputtering targets are mainly silicon sputtering targets, niobium sputtering targets, silicon dioxide sputtering targets, tantalum sputtering targets and other targets. AEM Deposition, as a professional sputtering target supplier and manufacturer, can supply sputtering targets suitable for optical coating. The details are as follows:

    Silicon Sputtering Target Niobium Sputtering Target Silicon Dioxide Sputtering Target Tantalum Sputtering Target

    Sputtering target application of optical devices
    The sputtering target of optical devices is widely used in smart phones, vehicle lens, security monitoring equipment, digital cameras, CD-ROM, projectors and other products. The sputtering target of optical devices can also be used in aerospace monitoring lens, biometric equipment and DNA in life science optical components and lenses required for research equipment such as sequencing, medical examination instrument lens, semiconductor detection equipment, large field projection lens (such as IMAX), 3D printer and other instruments and equipment.
     
    In addition to sputtering targets for optical devices, AEM deposition can also provide sputtering targets for integrated circuits, flat panel displays, solar cells, magnetic recording media and other fields. Please refer to the table below for details.
     
    Pure Metal Sputtering Target Alloy Sputtering Target Oxide Sputtering Target Sulfide Sputtering Target
    Boride Sputtering Target Carbide Sputtering Target Silicide Sputtering Target
    Telluride Sputtering Target Nitride Sputtering Target Fluoride Sputtering Target  

    If you are interested in the sputtering target, please click the link to enter the corresponding product page to learn more! If you have other needs, you can also email us directly. E-mail:[email protected]
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