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Tantalum Oxide Sputtering Targets (Ta2Ox)

Tantalum Oxide Sputtering Targets (Ta2Ox)
Material Type Tantalum Oxide
Symbol Ta2Ox
Color/Appearance Black, Solid
Melting Point (°C) 1,872
Theoretical Density (g/cc) 8.2
Z Ratio 0.3
Sputter RF, RF-R
Max Power Density*
(Watts/Square Inch)
Type of Bond Indium, Elastomer
Comments Slight decomposition. Evaporate Ta in 10-3 Torr O2.


Tantalum pentoxide, also known as tantalum(V) oxide, is the inorganic compound with the formula Ta2O5. It is a white solid that is insoluble in all solvents but is attacked by strong bases and hydrofluoric acid. Ta2O5 is an inert material with a high refractive index and low absorption (i.e. colourless), which makes it useful for coatings. It is also extensively used in the production of capacitors, due to its high dielectric constant.

Material Notes

Tantalum Oxide Sputtering Target, Purity is 99.95%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.


Other Information of Tantalum Oxide Sputtering Targets

• Gate Dielectric

• For CMOS

• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

• 99.9% ex Strontium Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

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