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Tantalum Sputtering Targets (Ta)

Tantalum Sputtering Targets (Ta)
Material Type Tantalum
Symbol Ta
Atomic Weight 180.94788
Atomic Number 73
Color/Appearance Gray Blue, Metallic
Thermal Conductivity 57 W/m.K
Melting Point (°C) 3,017
Coefficient of Thermal Expansion 6.3 x 10-6/K
Theoretical Density (g/cc) 16.6
Z Ratio 0.262
Sputter DC
Max Power Density*
(Watts/Square Inch)
Type of Bond Indium, Elastomer
Comments Forms good films.


Tantalum is dark (blue-gray), dense, ductile, very hard, easily fabricated, and highly conductive of heat and electricity. The metal is renowned for its resistance to corrosion by acids; in fact, at temperatures below 150  ℃ tantalum is almost completely immune to attack by the normally aggressive aqua regia. It can be dissolved with hydrofluoric acid or acidic solutions containing the fluoride ion and sulfur trioxide, as well as with a solution of potassium hydroxide. Tantalum's high melting point of 3017(boiling point 5458 ) is exceeded among the elements only by tungsten, rhenium and osmium for metals, and ca.

Material Notes

Tantalum Sputtering Targets, Purity is 99.95%;Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.

Other Information of Tantalum Sputtering Targets

Optical films
• Semiconductor
• Diffusion barrier layer
• High purity
• Grain refined, engineered microstructure


Manufacturing Process
  Multiple step electron beam melting
• Grain refinement
  Thermomechanical treatment
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment
99.95% minimum purity
• Planar circular targets up to 16'' (400mm) diameter
• Planar tiles up to 60
'' (1500 mm) X 15.75'' (400mm) for larger target configurations
• Smaller sizes also available for R&D applications
• Sputtering target bonding service

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