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AEM Deposition

Hafnium Sputtering Targets (Hf)

Hafnium Sputtering Targets (Hf)
Hafnium Sputtering Targets (Hf)
Material Type Hafnium
Symbol Hf
Atomic Weight 178.49
Atomic Number 72
Color/Appearance Gray Steel, Metallic
Thermal Conductivity 23 W/m.K
Melting Point (°C) 2,227
Coefficient of Thermal Expansion 5.9 x 10-6/K
Theoretical Density (g/cc) 13.31
Z Ratio 0.36
Sputter DC
Max Power Density*
(Watts/Square Inch)
Type of Bond Indium, Elastomer
Export Control (ECCN) 1C231


Hafnium is a chemical element with symbol Hf and atomic number 72. A lustrous, silvery gray, tetravalent transition metal, hafnium chemically resembles zirconium and is found in many zirconium minerals. Its existence was predicted by Dmitri Mendeleev in 1869, though it was not identified until 1923, making it the penultimate stable element to be discovered (rhenium was identified two years later). Hafnium is named after Hafnia, the Latin name for Copenhagen, where it was discovered.

Material Notes

Hafnium Sputtering Targets, Purity is Hf+Zr 99.95%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.This is an Export Controlled Material. Restrictions may apply.

Other Information of Hafnium Sputtering Targets

• Semiconductor
• Flat panel displays
Competitive pricing
• High purity
• Grain refined, engineered microstructure
• Semiconductor grade

Manufacturing Process
  Three-layer electrolytic process
• Melting and casting
  Electrical resistance furnace - Semi-continuous casting
• Grain refinement
  Thermomechanical treatment
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment
99% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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